Cover Image

Electron-beam, X-ray, & ion-beam techniques for submicrometer lithographies V : 11-12 March 1986, Santa Clara, California /

Bibliographic Details
Corporate Author: Society of Photo-optical Instrumentation Engineers
Other Authors: Blais, Phillip D.
Format: Book
Language:English
Published: Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, [1986]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 632.
Subjects:
X-ray lithography > Congresses.
Lithography, Electron beam > Congresses.
Ion beam lithography > Congresses.
Description
Physical Description:vi, 272 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographies and index.
ISBN:089252667X (pbk.)