Society of Photo-optical Instrumentation Engineers & Blais, P. D. (1986). Electron-beam, X-ray, & ion-beam techniques for submicrometer lithographies V: 11-12 March 1986, Santa Clara, California. SPIE--the International Society for Optical Engineering.
Chicago Style (17th ed.) CitationSociety of Photo-optical Instrumentation Engineers and Phillip D. Blais. Electron-beam, X-ray, & Ion-beam Techniques for Submicrometer Lithographies V: 11-12 March 1986, Santa Clara, California. Bellingham, Wash., USA: SPIE--the International Society for Optical Engineering, 1986.
MLA (9th ed.) CitationSociety of Photo-optical Instrumentation Engineers and Phillip D. Blais. Electron-beam, X-ray, & Ion-beam Techniques for Submicrometer Lithographies V: 11-12 March 1986, Santa Clara, California. SPIE--the International Society for Optical Engineering, 1986.