Advances in resist technology and processing II : March 11-12, 1985, Santa Clara, California /

Bibliographic Details
Corporate Authors:	International Society for Hybrid Microelectronics, Society of Photo-optical Instrumentation Engineers
Other Authors:	Thompson, L. F., 1944-
Format:	Book
Language:	English
Published:	Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, [1985]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 539.
Subjects:	Photoresists > Congresses.

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