Cover Image

Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV : March 14-15, 1985, Santa Clara, California /

Bibliographic Details
Corporate Author: International Society for Hybrid Microelectronics
Other Authors: Blais, Phillip D.
Format: Book
Language:English
Published: Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, [1985]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 537.
Subjects:
Lithography, Electron beam > Congresses.
X-ray lithography > Congresses.
Ion beam lithography > Congresses.
Description
Physical Description:vi, 219 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographies and index.
ISBN:089252572X (pbk.)