Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV : March 14-15, 1985, Santa Clara, California /

Bibliographic Details
Corporate Author:	International Society for Hybrid Microelectronics
Other Authors:	Blais, Phillip D.
Format:	Book
Language:	English
Published:	Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, [1985]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 537.
Subjects:	Lithography, Electron beam > Congresses. X-ray lithography > Congresses. Ion beam lithography > Congresses.

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