Cover Image

Submicron lithography /

Bibliographic Details
Corporate Authors: International Society for Hybrid Microelectronics, Northern California Microphotomask/Masking Working Group, Materials Research Society
Other Authors: Blais, Phillip D.
Format: Book
Language:English
Published: Bellingham, Wash. : International Society for Optical Engineering, 1982.
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 333.
Subjects:
Photoresists > Congresses.
Photolithography > Congresses.
Online Access:https://www.spiedigitallibrary.org/conference-proceedings-of-SPIE/0333.toc

Internet

https://www.spiedigitallibrary.org/conference-proceedings-of-SPIE/0333.toc

Remote Storage

Holdings details from Remote Storage
Call Number: TK7874 S85 1982
 
Call Number Status Get It
TK7874 S85 1982 Available