Cover Image

Developments in semiconductor microlithography IV : April 23-24, 1979, San Jose, California /

Bibliographic Details
Corporate Author: Northern California Microphotomask/Masking Working Group
Other Authors: Dey, Jim
Format: Book
Language:English
Published: Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, [1979]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 174.
Subjects:
Semiconductors > Congresses.
Photolithography > Congresses.
Thin-film circuits > Congresses.
Microelectronics > Congresses.
Online Access:https://www.spiedigitallibrary.org/conference-proceedings-of-SPIE/0174.toc
Description
Item Description:Proceedings of a seminar.
Physical Description:vi, 194 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and indexes.
ISBN:089252202X