Cover Image

Developments in semiconductor microlithography IV : April 23-24, 1979, San Jose, California /

Bibliographic Details
Corporate Author: Northern California Microphotomask/Masking Working Group
Other Authors: Dey, Jim
Format: Book
Language:English
Published: Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, [1979]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 174.
Subjects:
Semiconductors > Congresses.
Photolithography > Congresses.
Thin-film circuits > Congresses.
Microelectronics > Congresses.
Online Access:https://www.spiedigitallibrary.org/conference-proceedings-of-SPIE/0174.toc

Internet

https://www.spiedigitallibrary.org/conference-proceedings-of-SPIE/0174.toc

Remote Storage

Holdings details from Remote Storage
Call Number: TK7871.85 .D495
 
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TK7871.85 .D495 Available