APA (7th ed.) Citation

Northern California Microphotomask/Masking Working Group & Dey, J. (1979). Developments in semiconductor microlithography IV: April 23-24, 1979, San Jose, California. Society of Photo-optical Instrumentation Engineers.

Chicago Style (17th ed.) Citation

Northern California Microphotomask/Masking Working Group and Jim Dey. Developments in Semiconductor Microlithography IV: April 23-24, 1979, San Jose, California. Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers, 1979.

MLA (9th ed.) Citation

Northern California Microphotomask/Masking Working Group and Jim Dey. Developments in Semiconductor Microlithography IV: April 23-24, 1979, San Jose, California. Society of Photo-optical Instrumentation Engineers, 1979.