Defect recognition and image processing in III-V compounds, II : proceedings of the Second International Symposium on Defect Recognition and Image Processing in III-V Compounds (DRIP II), Monterey, California, April 27- 29, 1987 /

Bibliographic Details
Corporate Author: International Symposium on Defect Recognition and Image Processing in III-V Compounds Monterey, Calif.
Other Authors: Weber, Eicke R.
Format: Conference Proceeding Book
Language:English
Published: Amsterdam ; New York : Elsevier, 1987.
Series:Materials science monographs ; 44.
Subjects:

MARC

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111 2 |a International Symposium on Defect Recognition and Image Processing in III-V Compounds  |n (2nd :  |d 1987 :  |c Monterey, Calif.) 
245 1 0 |a Defect recognition and image processing in III-V compounds, II :  |b proceedings of the Second International Symposium on Defect Recognition and Image Processing in III-V Compounds (DRIP II), Monterey, California, April 27- 29, 1987 /  |c edited by Eicke R. Weber. 
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300 |a x, 320 pages :  |b illustrations 
336 |a text  |b txt  |2 rdacontent 
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490 1 |a Materials science monographs ;  |v 44 
504 |a Bibliography: pages 318-320. 
500 |a Includes index. 
650 0 |a Semiconductors  |x Defects  |v Congresses. 
650 0 |a Gallium arsenide semiconductors  |v Congresses. 
650 0 |a Image processing  |v Congresses. 
700 1 |a Weber, Eicke R. 
830 0 |a Materials science monographs ;  |v 44. 
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