Extreme ultraviolet lithography /
In this second edition of Extreme Ultraviolet Lithography, coverage is maintained on the fundamental aspects of EUV lithographic technology for topics such as exposure tools, light sources, masks, resists, process control, metrology and computational lithography. Lithography costs, which have often...
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| Format: | Book |
| Language: | English |
| Published: |
Bellingham, Washington :
SPIE Press,
[2025].
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| Edition: | Second edition. |
| Series: | SPIE Press monograph ;
PM396. |
| Subjects: |
| Summary: | In this second edition of Extreme Ultraviolet Lithography, coverage is maintained on the fundamental aspects of EUV lithographic technology for topics such as exposure tools, light sources, masks, resists, process control, metrology and computational lithography. Lithography costs, which have often influenced areas of technical focus, are also discussed. Many updates are included that reflect the significant advances in EUV lithography since the publication of the first edition. All topics are approached from the perspective of a practicing lithographer in a wafer fab, working in either manufacturing or development, and there are many references at the end of each chapter. |
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| Physical Description: | xii, 327 pages : illustrations (some color) ; 26 cm. |
| Bibliography: | Includes bibliographical references and index. |
| ISBN: | 9781510692534 1510692533 |