2D materials for electronics, sensors and devices : synthesis, characterization, fabrication and application /

2D Materials for Electronics, Sensors and Devices: Synthesis, Characterization, Fabrication and Application provides an overview of various top-down and bottom-up synthesis techniques, along with stitching, stacking and stoichiometric control methods for different 2D materials and their heterostruct...

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Bibliographic Details
Corporate Author: ScienceDirect (Online service)
Other Authors: Das, Saptarshi (Editor)
Format: eBook
Language:English
Published: Amsterdam : Elsevier, 2022.
Series:Nanophotonique.
Subjects:
Online Access:Connect to the full text of this electronic book
Table of Contents:
  • Front cover
  • Half Title
  • Title
  • Copyright
  • Contents
  • Contributors
  • Chapter 1 Scalable synthesis of 2D materials
  • 1.1 Introduction
  • 1.2 Large-area graphene synthesis
  • 1.2.1 Top-down: exfoliation and wafer-scale deposition
  • 1.2.2 Bottom-up synthesis
  • 1.3 Large-area transition metal dichalcogenide synthesis
  • 1.3.1 Film conversion
  • 1.3.2 Vapor-phase deposition methods
  • 1.4 Large-area hexagonal boron nitride synthesis
  • 1.4.1 Chemical vapor deposition
  • 1.4.2 Molecular beam epitaxy
  • Conclusion
  • Acknowledgement
  • References
  • Chapter 2 Synthesis of 2D heterostructures
  • 2.1 Introduction
  • 2.2 Direct synthesis methods for 2D heterostructures
  • 2.2.1 CVD methods and the effect of different precursors
  • 2.3 Synthesis of multijunction heterostructures
  • 2.3.1 Using the CVD Process
  • 2.3.2 MOCVD process
  • 2.3.3 Molecular Beam Epitaxy
  • 2.4 Vertical heterostructure
  • 2.4.1 Graphene and hBN
  • 2.4.2 Graphene with TMDs
  • 2.4.3 TMD/TMD heterostructures
  • 2.4.4 Janus vertical and lateral heterostructure
  • 2.5 Phase engineering in lateral heterostructures
  • 2.5.1 Phase-selective synthesis
  • 2.5.2 Phase transition
  • Conclusion
  • References
  • Chapter 3 Characterization of 2D transition metal dichalcogenides
  • 3.1 Introduction
  • 3.2 Raman spectroscopy of 2D materials
  • 3.3 Raman scattering in TMDs
  • 3.3.1 Identifying the number of layers
  • 3.3.2 Identifying defects and doping
  • 3.3.3 Identifying stacking order in TMDs
  • 3.3.4 Measuring interlayer coupling in 2D van der Waals heterostructures (vdWHs)
  • 3.3.5 Identifying TMD-based alloys
  • 3.3.6 Identifying phase transition
  • 3.3.7 Identifying the strain
  • 3.4 Photoluminescence spectroscopy
  • 3.5 PL in 2D TMDs
  • 3.5.1 Identifying the number of layers
  • 3.5.2 Identifying defects
  • 3.5.3 Identifying doping
  • 3.5.4 Identifying strain.
  • 3.5.5 Effect of temperature
  • 3.5.6 Effect of substrate
  • 3.6 Atomic force microscopy and Kelvin probe force microscopy
  • 3.6.1 Working principle
  • 3.6.2 Different modes of AFM
  • 3.6.3 Role of AFM and its electrical modes in probing 2D materials and their heterojunctions
  • 3.7 Transmission electron microscope
  • 3.7.1 Identifying the phase transition of 2D materials
  • 3.7.2 Identifying defects
  • 3.7.3 Identifying structural changes
  • 3.8 X-ray photoelectron spectroscopy
  • 3.8.1 Principle and elemental analysis
  • 3.8.2 Identifying phases of TMDs
  • 3.8.3 Effect of doping
  • 3.9 Conclusion
  • References
  • Further reading
  • Chapter 4 2D heterostructures for advanced logic and memory devices
  • 4.1 Background
  • 4.1.1 Overview of 2D materials
  • 4.1.2 2D van der Waals materials for transistors
  • 4.1.3 Top gate and bottom gate FETs
  • 4.1.4 Short-channel effects
  • 4.1.5 Heterointegration
  • 4.2 Tunable junction diodes and tunneling transistors
  • 4.2.1 2D homojunctions
  • 4.2.2 2D heterojunctions
  • 4.2.3 2D material-based tunneling devices
  • 4.2.4 Transistor scaling and low-power devices
  • 4.3 Transistor memories and memristive devices
  • 4.3.1 Floating gate memories
  • 4.3.2 Ferroelectric memory devices
  • 4.3.3 Memristive devices
  • 4.3.4 Resistive switching mechanism in memristive devices
  • 4.3.5 Lateral and vertical memristive devices from 2D materials
  • 4.3.6 Memristive devices from 2D-MoS2
  • 4.3.7 Memristive devices based on insulating hBN
  • 4.4 Conclusions and outlook
  • References
  • Chapter 5 2D materials for flexible electronics
  • 5.1 Introduction
  • 5.2 Fabrication techniques
  • 5.2.1 Mechanical exfoliation
  • 5.2.2 Chemical exfoliation
  • 5.2.3 CVD synthesis
  • 5.2.4 Growth of novel heterostructures
  • 5.2.5 Patterned growth
  • 5.2.6 Direct growth on polymeric supporting substrates
  • 5.2.7 Transfer method.
  • 5.3 Flexible devices for various applications
  • 5.3.1 Flexible transistors
  • 5.3.2 Flexible sensors
  • 5.3.3 Flexible energy storage devices: batteries and supercapacitors
  • 5.4 Conclusions and future outlook
  • References
  • Chapter 6 2D materials for optoelectronics
  • 6.1 Introduction
  • 6.2 Background and overview
  • 6.2.1 Device architectures and operating mechanisms
  • 6.2.2 Measurements and benchmarking
  • 6.3 Devices and applications
  • 6.3.1 Photodetectors
  • 6.3.2 Photovoltaics
  • 6.3.3 Light emission
  • 6.3.4 Flexible devices
  • 6.3.5 Photonic devices
  • 6.4 New application horizons
  • 6.4.1 Tunable and reconfigurable devices
  • 6.4.2 Optical memories
  • 6.4.3 Straintronics
  • 6.4.4 Superlattices
  • 6.4.5 Neuromorphic applications
  • 6.5 Conclusions
  • 6.5.1 Gaps and challenges
  • 6.5.2 Outlook
  • References
  • Chapter 7 2D materials for neuromorphic devices
  • 7.1 Introduction
  • 7.2 2D synapses: two-terminal memristor
  • 7.2.1 Metal ion migration
  • 7.2.2 Vacancy migration
  • 7.2.3 Phase change mechanism
  • 7.3 Two-dimensional synapses: three-terminal transistor
  • 7.3.1 Charge trapping/detrapping
  • 7.3.2 Ionic gating for synaptic devices
  • 7.3.3 Tunneling effect
  • 7.3.4 Multigate synergistic effect
  • 7.3.5 Anisotropy
  • 7.4 2D Materials vdW heterostructures
  • 7.5 Conclusions and outlook
  • References
  • Index
  • Back cover.