rdf-syntax-grammar
mods:
  schema location: http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
  title info:
    title: Modern ion plating technology
    sub title: fundamentals and applications
  name:
    name part: Wang, Fuzhen
    role:
      role term: creator
    role:
      role term: author.
  name:
    name part: Wu, Junwei
    role:
      role term: author.
  name:
    name part: ScienceDirect (Online service)
  type of resource: text
  genre: bibliography
  genre: Electronic books.
  genre: Llibres electrònics.
  origin info:
    place:
      place term: ne
    date issued: 2023
    copyright date: 2023
    issuance: monographic
  language:
    language term: eng
  physical description:
    form: remote
    extent: 1 online resource
  abstract: "Modern Ion Plating Technology: Fundamentals and Applications discusses the fundamental concepts of plasma physics in various coating technologies and explores its development and implementation into new technologies. Recent progress of technologies and products via ion plating will be introduced. The book begins with the treatment of vacuum physics, through plasma physics. It then presents the various forms of ion plating, before concluding with a section presenting examples of applications where ion plating is employed. Through the material presented in this book, the reader gains an understanding of the importance of ion plating technology to human progress and its various potential applications. Under the guidance of plasma physics knowledge, how to use electric and electromagnetic fields to control the space plasma will be critical to the development of new technology and systems" --
  table of contents: Introduction to modern ion plating technology -- Fundamentals of vacuum physics -- Fundamentals of plasma physics -- Vacuum evaporation coating technology -- Glow discharge ion plating technology -- Arc discharge ion plating technology by hot electron emission -- Cathodic arc ion plating -- Magnetron sputtering -- Effect of charged particle flow on plating -- Plasma-enhanced chemical vapor deposition -- Plasma polymerization -- Applications in solar thin films -- Applications in information display films -- Applications in decorative films -- Applications in optical films -- Applications of hard coatings -- Applications in carbon-based film -- Applications in thermoelectric thin films -- New advances in low-temperature plasma chemical heat treatment.
  note: Fuzhen Wang, Junwei Wu.
  note: Includes bibliographical references and index.
  subject:
    topic: Ion plating
  subject:
    topic: Coating processes
  subject:
    topic: Dépôt ionique
  subject:
    topic: Revêtement de surface
  subject:
    topic: ion plating
  subject:
    topic: coating (process)
  subject:
    topic: Coating processes
  subject:
    topic: Ion plating
  subject:
    topic: Revestiments
  subject:
    topic: Superfícies (Tecnologia)
  classification: TS695.2 .W36 2023eb
  classification: 667.9
  related item:
    title info:
      title: Modern ion plating technology
    name:
      name part: Wang, Fuzhen
    origin info:
      publisher: Amsterdam, Netherlands Cambridge, MA : Elsevier, [2023]
    identifier: (OCoLC)1303077969
  identifier: 9780323908344
  identifier: 0323908349
  identifier: 9780323908337
  identifier: 0323908330
  identifier: http://proxy.library.tamu.edu/login
  record info:
    record content source: EBLCP
    record creation date: 221008
    record change date: 20260327173519.4
    record identifier: in00005770781
    language of cataloging:
      language term: eng