Directed self-assembly of block copolymers for nano-manufacturing /
The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufactur...
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| Other Authors: | , |
| Format: | eBook |
| Language: | English |
| Published: |
Cambridge :
Woodhead Publishing,
[2015]
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| Series: | Woodhead Publishing series in electronic and optical materials ;
no. 83. |
| Subjects: | |
| Online Access: | Connect to the full text of this electronic book |
| Summary: | The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new. |
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| Physical Description: | 1 online resource |
| Bibliography: | Includes bibliographical references and index. |
| ISBN: | 9780081002612 0081002610 0081002505 9780081002506 |