rdf-syntax-grammar
mods:
  schema location: http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
  title info:
    title: Developments in surface contamination and cleaning
    part number: Volume three
    part name: Methods for removal of particle contaminants
  title info:
    title: Methods for removal of particle contaminants
  name:
    name part: Kohli, Rajiv
    name part: 1947-
  name:
    name part: Mittal, K. L.
    name part: 1945-
  name:
    name part: ScienceDirect (Online service)
  type of resource: text
  genre: bibliography
  genre: Electronic books.
  origin info:
    place:
      place term: ne
    place:
      place term: Amsterdam
    place:
      place term: Boston
    publisher: Elsevier
    date issued: ©2011
    date issued: 2011
    issuance: monographic
  language:
    language term: eng
  physical description:
    form: remote
    extent: 1 online resource (xiii, 243 pages)
  abstract: The contributions in this volume cover methods for removal of particle contaminants on surfaces. Several of these methods are well established and have been employed in industrial applications for a long time. However, the ever- higher demand for removal of smaller particles on newer substrate materials is driving continuous development of the established cleaning methods and alternative innovative methods for particle removal. This book provides information on the latest developments in this topic area. The purpose of the Developments in Surface Contamination and Cleaning series is to provide a state-of-the-art guide to the current knowledge of the behaviour of film-type and particulate surface contaminants, and cleaning methods. Each title has a particular topical focus, covering the key techniques and recent developments in the area. Taken as a whole, the series forms a unique reference for professionals and academics working in the area of surface contamination and cleaning. A strong theme running through the series is that of surface contamination and cleaning at the micro and nano scales. Covers the latest techniques in areas such as removal of nanoparticles, especially important in the semiconductor industry, disk drives and microelectronics. The series as a whole represents the definitive reference on Surface Contamination and Cleaning An essential reference for industries where cleaning is critical: electronics, optics, pharmaceutical manufacturing, etc.
  table of contents: Aqueous Methods -- Megasonic Cleaning -- Hydrodynamic Removal of Particles -- Brush Cleaning -- Laser Methods for Cleaning -- CO₂ Pellet Cleaning -- Cleaning Using Acoustic Fields -- Precision Cleaning Using Cluster Beams -- Electrostatic Methods for Cleaning -- Wipers for Cleaning -- Projectile Cleaning.
  note: edited by Rajiv Kohli and K.L. Mittal.
  note: Includes bibliographical references and index.
  subject:
    topic: Surfaces (Technology)
    topic: Cleaning
  subject:
    topic: Surface contamination
  subject:
    topic: Surfaces (Technologie)
    topic: Nettoyage
  subject:
    topic: Contamination de surface
  subject:
    topic: Surface contamination
  classification: TA418.7 .D48 2011eb
  classification: 620/.44
  identifier: 9781437778854
  identifier: 1437778852
  identifier: http://proxy.library.tamu.edu/login
  record info:
    record content source: OPELS
    record creation date: 110419
    record change date: 20260326185633.4
    record identifier: in00005747976
    language of cataloging:
      language term: eng