rdf-syntax-grammar
mods:
  schema location: http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
  title info:
    title: Thin films by chemical vapour deposition
  title info:
    title: Depunerea chimică din vapori a straturilor subțiri. English
  name:
    name part: Moroșanu, C. E.
    role:
      role term: creator
  name:
    name part: ScienceDirect (Online service)
  type of resource: text
  genre: bibliography
  genre: Electronic books.
  origin info:
    place:
      place term: ne
    place:
      place term: Amsterdam
    place:
      place term: New York
    place:
      place term: Bucharest, Romania
    publisher: Elsevier
    publisher: Editura Tehnică
    date issued: 1990
    issuance: monographic
  language:
    language term: eng
  language:
    language term: rum
  physical description:
    reformatting quality: access
    form: remote
    extent: 1 online resource (717 pages) : illustrations
  abstract: The explosive growth in the semiconductor industry has caused a rapid evolution of thin film materials that lend themselves to the fabrication of state-of-the-art semiconductor devices. Early in the 1960s an old research technique named chemical vapour phase deposition (CVD), which has several unique advantages, developed into the most widely used technique for thin film preparation in electronics technology. In the last 25 years, tremendous advances have been made in the science and technology of thin films prepared by means of CVD. This book presents in a single volume, an up-to-date overvie.
  table of contents: Front Cover; Thin Films by Chemical Vapour Deposition; Preface; Acknowledgements; Table of Contents; Part I: INTRODUCTION; CHAPTER 1. EVOLUTION OF CVD FILMS; 1.1 Introductory Remarks; 1.2 Short History of CVD Thin Films; Part II: FUNDAMENTALS; CHAPTER 2. TECHNIQUES OF PREPARING THIN FILMS; 2.1 Introduction; 2.2 Electrolytic Deposition Techniques; 2.3 Vacuum Deposition Techniques; 2.4 Plasma Deposition Techniques; 2.5 Liquid-Phase Deposition Techniques; 2.6 Solid-Phase Deposition Techniques; 2.7 Chemical Vapour Conversion of Substrate; 2.8 Chemical Vapour Deposition.
  table of contents: 2.9 Comparison between CVD and Other Thin Film Deposition TechniquesCHAPTER 3. CHEMICAL PROCESSES USED IN CVD; 3.1 Introduction; 3.2 Description of Chemical Reactions Used in CVD; CHAPTER 4. THERMODYNAMICS OF CVD; 4.1 General Remarks; 4.2 Feasibility of a CVD Process; 4.3 Techniques for Equilibrium Calculations in CVD Systems; 4.4 Examples of Thermodynamic Studies of CVD Systems; CHAPTER 5. KINETICS OF CVD; 5.1 Introduction; 5.2 Steps and Control Type of a CVD Heterogeneous Reaction; 5.3 Influence of Experimental Parameters on Thin Film Deposition Rate.
  table of contents: 5.4 Continuous Measurement of the Deposition Rate5.5 Experimental Methods for Studying CVD Kinetics; 5.6 Role of Homogeneous Reactions in CVD; 5.7 Mechanism of CVD Processes; 5.8 Kinetics and Mechanism of Dopant Incorporation; 5.9 Transport Phenomena in CVD; 5.10 Status of Kinetic and Mechanism Investigations in CVD Systems; CHAPTER 6. MEASUREMENT OF THIN FILM THICKNESS; 6.1 Introduction; 6.2 Mechanical Methods; 6.3 Mechanical-Optical Methods; 6.4 Optical Methods; 6.5 Electrical Methods; 6.6 Miscellaneous Methods; CHAPTER 7. NUCLEATION AND GROWTH OF CVD FILMS; 7.1 Introduction.
  table of contents: 7.2 Stages in the Nucleation and Growth Mechanism7.3 Regimes of Nucleation and Growth; 7.4 Nucleation Theory; 7.5 Dependence of Nucleation on Deposition Parameters; 7.6 Heterogeneous Nucleation and CVD Film Structural Forms; 7.7 Homogeneous Nucleation; 7.8 Experimental Techniques; 7.9 Experimental Results of CVD Film Nucleation; CHAPTER 8. THIN FILM STRUCTURE; 8.1 Introduction; 8.2 Techniques for Studying Thin Film Structure; 8.3 Structural Defects in CVD Thin Films; CHAPTER 9. ANALYSIS OF CVD FILMS; 9.1 Introduction; 9.2 Analysis Techniques of Thin Film Bulk.
  table of contents: 9.3 Analysis Techniques of Thin Film Surfaces9.4. Film Composition Measurement; 9.5 Depth Concentration Profiling; CHAPTER 10. PROPERTIES OF CVD FILMS; 10.1 Introduction; 10.2 Mechanical Properties; 10.3. Thermal Properties; 10.4 Optical Properties; 10.5. Photoelectric Properties; 10.6 Electrical Properties; 10.7 Magnetic Properties; 10.8 Chemical Properties; Part III: TECHNIQUES; CHAPTER 11. EQUIPMENT AND SUBSTRATES; 11.1 Introduction; 11.2 Equipment for CVD; 11.3 Safety in CVD; 11.4 Substrates; CHAPTER 12 PREPARATION AND PROPERTIES OF SEMICONDUCTING THIN FILMS; 12.1 Introduction.
  note: C.E. Moroșanu.
  note: Rev., updated, and enl. translation of: Depunerea chimică din vaporie a straturilor subțiri.
  note: Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002. http://purl.oclc.org/DLF/benchrepro0212 MiAaHDL
  note: digitized 2010 HathiTrust Digital Library committed to preserve pda MiAaHDL
  note: Includes bibliographical references (pages 525-681) and indexes.
  note: English.
  subject:
    topic: Vapor-plating
  subject:
    topic: Thin films
  subject:
    topic: Semiconductors
  subject:
    topic: Semiconductors
  subject:
    topic: Couches minces
  subject:
    topic: Semi-conducteurs
  subject:
    topic: semiconductor
  subject:
    topic: TECHNOLOGY & ENGINEERING
    topic: Technical & Manufacturing Industries & Trades
  subject:
    topic: Semiconductors
  subject:
    topic: Thin films
  subject:
    topic: Vapor-plating
  subject:
    topic: Aufdampfen
  subject:
    topic: Dünne Schicht
  classification: TS695 .M6713 1990
  classification: 671.7/35
  classification: UP 7550
  classification: PHY 658f
  related item:
    title info:
      title: Thin films by chemical vapour deposition
    title info:
      title: Depunerea chimică din vapori a straturilor subțiri. English
    name:
      name part: Moroșanu, C.E.
    origin info:
      publisher: Amsterdam ; New York : Elsevier ; Bucharest, Romania : Editura Tehnică, 1990
    identifier: (DLC) 89023513
    identifier: (OCoLC)20318559
  related item:
    title info:
      title: Thin films science and technology ; 7
  identifier: 9781483291734
  identifier: 1483291731
  identifier: 0444988017
  identifier: 9780444988010
  identifier: http://proxy.library.tamu.edu/login
  record info:
    record content source: OCLCE
    record creation date: 100626
    record change date: 20260326175331.5
    record identifier: in00005743289
    language of cataloging:
      language term: eng