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Thin films by chemical vapour deposition
Depunerea chimică din vapori a straturilor subțiri. English
1 online resource (717 pages) : illustrations
The explosive growth in the semiconductor industry has caused a rapid evolution of thin film materials that lend themselves to the fabrication of state-of-the-art semiconductor devices. Early in the 1960s an old research technique named chemical vapour phase deposition (CVD), which has several unique advantages, developed into the most widely used technique for thin film preparation in electronics technology. In the last 25 years, tremendous advances have been made in the science and technology of thin films prepared by means of CVD. This book presents in a single volume, an up-to-date overvie.
Front Cover; Thin Films by Chemical Vapour Deposition; Preface; Acknowledgements; Table of Contents; Part I: INTRODUCTION; CHAPTER 1. EVOLUTION OF CVD FILMS; 1.1 Introductory Remarks; 1.2 Short History of CVD Thin Films; Part II: FUNDAMENTALS; CHAPTER 2. TECHNIQUES OF PREPARING THIN FILMS; 2.1 Introduction; 2.2 Electrolytic Deposition Techniques; 2.3 Vacuum Deposition Techniques; 2.4 Plasma Deposition Techniques; 2.5 Liquid-Phase Deposition Techniques; 2.6 Solid-Phase Deposition Techniques; 2.7 Chemical Vapour Conversion of Substrate; 2.8 Chemical Vapour Deposition.
2.9 Comparison between CVD and Other Thin Film Deposition TechniquesCHAPTER 3. CHEMICAL PROCESSES USED IN CVD; 3.1 Introduction; 3.2 Description of Chemical Reactions Used in CVD; CHAPTER 4. THERMODYNAMICS OF CVD; 4.1 General Remarks; 4.2 Feasibility of a CVD Process; 4.3 Techniques for Equilibrium Calculations in CVD Systems; 4.4 Examples of Thermodynamic Studies of CVD Systems; CHAPTER 5. KINETICS OF CVD; 5.1 Introduction; 5.2 Steps and Control Type of a CVD Heterogeneous Reaction; 5.3 Influence of Experimental Parameters on Thin Film Deposition Rate.
5.4 Continuous Measurement of the Deposition Rate5.5 Experimental Methods for Studying CVD Kinetics; 5.6 Role of Homogeneous Reactions in CVD; 5.7 Mechanism of CVD Processes; 5.8 Kinetics and Mechanism of Dopant Incorporation; 5.9 Transport Phenomena in CVD; 5.10 Status of Kinetic and Mechanism Investigations in CVD Systems; CHAPTER 6. MEASUREMENT OF THIN FILM THICKNESS; 6.1 Introduction; 6.2 Mechanical Methods; 6.3 Mechanical-Optical Methods; 6.4 Optical Methods; 6.5 Electrical Methods; 6.6 Miscellaneous Methods; CHAPTER 7. NUCLEATION AND GROWTH OF CVD FILMS; 7.1 Introduction.
7.2 Stages in the Nucleation and Growth Mechanism7.3 Regimes of Nucleation and Growth; 7.4 Nucleation Theory; 7.5 Dependence of Nucleation on Deposition Parameters; 7.6 Heterogeneous Nucleation and CVD Film Structural Forms; 7.7 Homogeneous Nucleation; 7.8 Experimental Techniques; 7.9 Experimental Results of CVD Film Nucleation; CHAPTER 8. THIN FILM STRUCTURE; 8.1 Introduction; 8.2 Techniques for Studying Thin Film Structure; 8.3 Structural Defects in CVD Thin Films; CHAPTER 9. ANALYSIS OF CVD FILMS; 9.1 Introduction; 9.2 Analysis Techniques of Thin Film Bulk.
9.3 Analysis Techniques of Thin Film Surfaces9.4. Film Composition Measurement; 9.5 Depth Concentration Profiling; CHAPTER 10. PROPERTIES OF CVD FILMS; 10.1 Introduction; 10.2 Mechanical Properties; 10.3. Thermal Properties; 10.4 Optical Properties; 10.5. Photoelectric Properties; 10.6 Electrical Properties; 10.7 Magnetic Properties; 10.8 Chemical Properties; Part III: TECHNIQUES; CHAPTER 11. EQUIPMENT AND SUBSTRATES; 11.1 Introduction; 11.2 Equipment for CVD; 11.3 Safety in CVD; 11.4 Substrates; CHAPTER 12 PREPARATION AND PROPERTIES OF SEMICONDUCTING THIN FILMS; 12.1 Introduction.
Rev., updated, and enl. translation of: Depunerea chimică din vaporie a straturilor subțiri.
Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002. http://purl.oclc.org/DLF/benchrepro0212 MiAaHDL
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Includes bibliographical references (pages 525-681) and indexes.
Technical & Manufacturing Industries & Trades
Amsterdam ; New York : Elsevier ; Bucharest, Romania : Editura Tehnică, 1990