Fine line lithography /

Bibliographic Details
Corporate Author:	ScienceDirect (Online service)
Other Authors:	Newman, Roger
Format:	eBook
Language:	English
Language Notes:	English.
Published:	Amsterdam ; New York : New York : North-Holland Pub. Co. ; Sole distributor for the USA and Canada, Elsevier North-Holland, 1980.
Series:	Materials processing, theory and practices ; v. 1.
Subjects:	Integrated circuits > Large scale integration. Lithography. Circuits intégrés à grande échelle. Lithographie. lithography. TECHNOLOGY & ENGINEERING > Electronics > Digital. TECHNOLOGY & ENGINEERING > Electronics > Microelectronics. Integrated circuits > Large scale integration Lithography Integrierte Schaltung Lithographie par faisceau d'électrons. Lithographie par rayons X. Photolithographie (Halbleitertechnologie) Electronic books.
Online Access:	Connect to the full text of this electronic book

Description
Physical Description:	1 online resource (vii, 481 pages)
Format:	Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002.
Bibliography:	Includes bibliographical references and index.
ISBN:	9780444853516 0444853510 9780444601285 0444601287 1299537200 9781299537200