Modeling of film deposition for microelectronic applications /
Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 22 volumes since 1963. The series contains quality studies of the properties of various thin filmsmaterials and systems. In order to be able to reflect the development of today's science an...
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| Format: | eBook |
| Language: | English |
| Published: |
San Diego :
Academic Press,
©1996.
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| Series: | Thin films ;
v. 22. |
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| Online Access: | Connect to the full text of this electronic book |
Table of Contents:
- M.J. Brett, S.K. Dew, and T.J. Smy, Thin Film Microstructure and Process Simulation Using SIMBAD. S. Hamaguchi, Mathematical Methods for Thin Films Deposition Simulations. C.-C. Fang, V. Prasad, R.V. Joshi, F. Jones, and J.J. Hsieh, A Process Model for Sputter-Deposition of Thin Films Using Molecular Dynamics. T.S. Cale and V. Mahadev, Feature Scale Transport and Reaction during Low Pressure. Chapter References. Author Index. Subject Index.
- Thin film microstructure and process simulation using SIMBAD / Michael J. Brett, Steven K. Dew, and Tom J. Smy
- Mathematical methods for thin film deposition simulations / S. Hamaguchi
- A process model for sputter deposition of thin films using molecular dynamics / C.-C. Fang [and others]
- Feature scale transport and reaction during low-pressure deposition processes / Timothy S. Cale and Vadali Mahadev.