Characterization in silicon processing /

This volume is devoted to the consideration of the use use of surface, thin film and interface characterization tools in support of silicon-based semiconductor processing. The approach taken is to consider each of the types of films used in silicon devices individually in its own chapter and to disc...

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Bibliographic Details
Corporate Author: ScienceDirect (Online service)
Other Authors: Strausser, Yale
Format: eBook
Language:English
Published: Boston : Greenwich : Butterworth-Heinemann ; Manning, ©1993.
Series:Materials characterization series.
Subjects:
Online Access:Connect to the full text of this electronic book
Table of Contents:
  • Applications of materials characterization techniques to silicon epitaxial growth
  • Polysilicon conductors
  • Silicides
  • Aluminum- and copper-based conductors
  • Tungsten-based conductors
  • Barrier films
  • Appendix: technique summaries.