Characterization in silicon processing /
This volume is devoted to the consideration of the use use of surface, thin film and interface characterization tools in support of silicon-based semiconductor processing. The approach taken is to consider each of the types of films used in silicon devices individually in its own chapter and to disc...
| Corporate Author: | |
|---|---|
| Other Authors: | |
| Format: | eBook |
| Language: | English |
| Published: |
Boston : Greenwich :
Butterworth-Heinemann ; Manning,
©1993.
|
| Series: | Materials characterization series.
|
| Subjects: | |
| Online Access: | Connect to the full text of this electronic book |
Table of Contents:
- Applications of materials characterization techniques to silicon epitaxial growth
- Polysilicon conductors
- Silicides
- Aluminum- and copper-based conductors
- Tungsten-based conductors
- Barrier films
- Appendix: technique summaries.