Characterization in silicon processing /

This volume is devoted to the consideration of the use use of surface, thin film and interface characterization tools in support of silicon-based semiconductor processing. The approach taken is to consider each of the types of films used in silicon devices individually in its own chapter and to disc...

Full description

Bibliographic Details
Corporate Author: ScienceDirect (Online service)
Other Authors: Strausser, Yale
Format: eBook
Language:English
Published: Boston : Greenwich : Butterworth-Heinemann ; Manning, ©1993.
Series:Materials characterization series.
Subjects:
Online Access:Connect to the full text of this electronic book
Description
Summary:This volume is devoted to the consideration of the use use of surface, thin film and interface characterization tools in support of silicon-based semiconductor processing. The approach taken is to consider each of the types of films used in silicon devices individually in its own chapter and to discuss typical problems seen throughout that films' history, including characterization tools which are most effectively used to clarifying and solving those problems.
Physical Description:1 online resource (xiii, 240 pages) : illustrations
Format:Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002.
Bibliography:Includes bibliographical references and index.
ISBN:1591245257
9781591245254
9780080523422
0080523420