rdf-syntax-grammar
mods:
  schema location: http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
  title info:
    title: Handbook of vacuum arc science and technology
    sub title: fundamentals and applications
  name:
    name part: Sanders, David M.
  name:
    name part: Boxman, R. L.
  name:
    name part: Martin, Philip J.
  name:
    name part: ScienceDirect (Online service)
  type of resource: text
  genre: bibliography
  genre: Electronic books.
  origin info:
    place:
      place term: nju
    place:
      place term: Park Ridge, N.J., U.S.A
    publisher: Noyes Publications
    date issued: ©1995
    date issued: 1995
    issuance: monographic
  language:
    language term: eng
  physical description:
    form: remote
    extent: 1 online resource (xxxi, 742 pages) : illustrations
  abstract: Describes the basic physics and technological applications of vacuum arcs. Part I describes basic physics of the vacuum arc, beginning with a brief tutorial review of plasma and electrical discharge physics, then describes the arc ignition process, cathode and anode spots which serve as the locus for plasma generation, and resultant interelectrode plasma. Part II describes the applications of the vacuum arc for depositing thin films and coatings, refining metals, switching high power, and as sources of intense electron, ion, plasma, and x-ray beams.
  table of contents: Part I: Fundamentals of Vacuum Arc Science and Technology -- Electrical Discharges and Plasmas-A Brief Tutorial -- Arc Ignition -- Cathode Spots -- The Interelectrode Plasma -- Anode Phenomena -- Part II: Applications of Vacuum Arc Science and Technology -- Coatings From the Vacuum Arc -- Vacuum Arc Metal Processing -- Vacuum Switching of High Current and High Voltage at Power Frequencies -- Pulsed Power Applications -- Index -- About the Contributors.
  note: edited by Raymond L. Boxman, David M. Sanders, Philip J. Martin ; foreword by James M. Lafferty.
  note: Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002. http://purl.oclc.org/DLF/benchrepro0212 MiAaHDL
  note: digitized 2010 HathiTrust Digital Library committed to preserve pda MiAaHDL
  note: Includes bibliographical references and index.
  subject:
    topic: Vacuum arcs
  subject:
    topic: Vacuum arcs
    topic: Industrial applications
  subject:
    topic: Plasma (Ionized gases)
  subject:
    topic: Arcs sous vide
  subject:
    topic: Arcs sous vide
    topic: Applications industrielles
  subject:
    topic: Plasma (Gaz ionisés)
  subject:
    topic: SCIENCE
    topic: Physics
    topic: Electromagnetism
  subject:
    topic: SCIENCE
    topic: Physics
    topic: Electricity
  subject:
    topic: Plasma (Ionized gases)
  subject:
    topic: Vacuum arcs
  subject:
    topic: Vacuum arcs
    topic: Industrial applications
  subject:
    topic: Vakuumlichtbogen
  subject:
    topic: Plasmas (gaz ionisés)
  subject:
    topic: Arc électrique
  subject:
    topic: Vacuum arcs
  subject:
    topic: Plasma (Ionized gases)
  subject:
    topic: Vacuum arcs
  subject:
    topic: Vacuum arcs
    topic: Industrial applications
  classification: QC705 .H36 1995eb
  classification: 537.5/3
  classification: UR 6000
  classification: 58.19
  related item:
    title info:
      title: Handbook of vacuum arc science and technology
    origin info:
      publisher: Park Ridge, N.J., U.S.A. : Noyes Publications, ©1995
    identifier: (DLC) 95022677
    identifier: (OCoLC)32665287
  related item:
    identifier: (DLC) 95022677
    identifier: (OCoLC)32665287
  related item:
    title info:
      title: Materials science and process technology series
      part name: Electronic materials and process technology
  identifier: 1591240980
  identifier: 9781591240983
  identifier: 9780815517795
  identifier: 0815517793
  identifier: 9780080946153
  identifier: 0080946151
  identifier: 9780815513759
  identifier: 0815513755
  identifier: 153813:153973 Elsevier Science & Technology
  identifier: http://proxy.library.tamu.edu/login
  record info:
    record content source: KNOVL
    record creation date: 011108
    record change date: 20260326144251.6
    record identifier: in00005729668
    language of cataloging:
      language term: eng