High density plasma sources : design, physics, and performance /
This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielec...
| Corporate Author: | |
|---|---|
| Other Authors: | |
| Format: | eBook |
| Language: | English |
| Language Notes: | English. |
| Published: |
Park Ridge, N.J. :
Noyes Publications,
©1995.
|
| Series: | Materials science and process technology series. Electronic materials and process technology.
|
| Subjects: | |
| Online Access: | Connect to the full text of this electronic book |
| Summary: | This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. |
|---|---|
| Physical Description: | 1 online resource (xx, 445 pages) : illustrations |
| Bibliography: | Includes bibliographical references and index. |
| ISBN: | 1591240638 9781591240631 9780815513773 0815513771 9780080946160 008094616X 9780815517887 0815517882 1282755080 9781282755086 9786612755088 6612755083 1282253212 9781282253216 9786612253218 6612253215 0815517890 9780815517894 |