Tribology in chemical-mechanical planarization /

The role that friction and contact play in the processes of wear and planarization on material surfaces is central to the understanding of Chemical-Mechanical planarization (CMP) technology, particularly when applied to nanosurfaces. Tribology in Chemical-Mechanical Planarization presents a detailed...

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Bibliographic Details
Main Author: Liang, Hong, 1961 (Author)
Corporate Author: Taylor & Francis
Other Authors: Craven, David R., 1945-
Format: eBook
Language:English
Language Notes:English.
Published: Boca Raton, Fla. : Taylor & Francis, 2005.
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Online Access:Connect to the full text of this electronic book
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by Liang, Hong, 1961-
Published 2005
Publisher description
Book