Spacer engineered FinFET architectures : high-performance digital circuit applicators /

Bibliographic Details
Main Authors:	Dasgupta, Sudeb (Author), Kaushik, Brajesh Kumar (Author), Pal, Pankaj Kumar (Author)
Corporate Author:	Taylor & Francis
Format:	eBook
Language:	English
Published:	Boca Raton : Taylor & Francis, CRC Press, 2017.
Subjects:	Metal oxide semiconductor field-effect transistors. Silicon-on-insulator technology. Transistors MOSFET. Silicium sur isolant. TECHNOLOGY & ENGINEERING > Mechanical. Metal oxide semiconductor field-effect transistors Silicon-on-insulator technology Electronic books.
Online Access:	Connect to the full text of this electronic book

Description
Abstract:	This book focusses on the spacer engineering aspects of novel MOS-based device circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.
Physical Description:	1 online resource
Bibliography:	Includes bibliographical references.
ISBN:	9781351751049 1351751042 9781315191089 1315191083 9781498783606 1498783600