High-k materials in multi-gate FET devices /

"This book focuses on high-k materials for advanced FET devices. It discusses emerging challenges in the engineering and applications and considers issues with associated technologies. This work will be of high interest to researchers in materials science, electronics engineering, IT, and relat...

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Bibliographic Details
Corporate Author: Taylor & Francis
Other Authors: Tayal, Shubham (Editor)
Format: eBook
Language:English
Published: Boca Raton, FL : CRC Press, 2021.
Edition:First edition.
Series:Science, technology, and management series.
Subjects:
Online Access:Connect to the full text of this electronic book
Description
Summary:"This book focuses on high-k materials for advanced FET devices. It discusses emerging challenges in the engineering and applications and considers issues with associated technologies. This work will be of high interest to researchers in materials science, electronics engineering, IT, and related disciplines studying nanodevices such as FinFET and Tunnel FET and device-circuit codesign issues"--
Physical Description:1 online resource (xii, 164 pages) : illustrations.
Bibliography:Includes bibliographical references and index.
ISBN:9781003121589
1003121586
9781000438789
1000438783
9781000438819
1000438813