rdf-syntax-grammar
mods:
  schema location: http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
  title info:
    title: Micro- and nanopatterning polymers
  name:
    name part: Ito, Hiroshi
    name part: 1946-
  name:
    name part: American Chemical Society
    name part: Division of Polymeric Materials: Science and Engineering.
  name:
    name part: American Chemical Society
    name part: Meeting
    name part: (214th : 1997 : Las Vegas, Nev.)
  type of resource: text
  genre: bibliography
  genre: conference publication
  genre: Electronic books.
  genre: Conference papers and proceedings
  origin info:
    place:
      place term: dcu
    place:
      place term: Washington, DC
    place:
      place term: New York]
    publisher: American Chemical Society
    publisher: Distributed by Oxford University Press
    date issued: ©1998
    date issued: 1998
    issuance: monographic
  language:
    language term: eng
  physical description:
    form: remote
    extent: 1 online resource (xii, 386 pages) : illustrations
  table of contents: Lithography with a pattern of block copolymer microdomains as a positive or negative resist / Christopher Harrison, Miri Park, Paul M. Chaikin, Richard A. Register, and Douglas H. Adamson -- Inorganic nanostructures on surfaces using micellar diblock copolymer templates / Joachim P. Spatz, Thomas Herzog, Stefan Mössmer, Paul Ziemann, and Martin Möller -- Synthesis of stereoregular polymers as precursors to highly conducting carbon for use in applications in micro- and nanolithography / C.B. Gorman, R.W. Vest, J.L. Snover, T.L. Utz, and S.A. Serron -- Metallization on poly(tetrafluoroethylene) substrate by excimer-laser-induced surface reaction and chemical plating / Hiroyuki Niino and Akira Yabe -- An inorganic approach to photolithography : the photolithographic deposition of dielectric metal oxide films / Ross H. Hill and Sharon L. Blair -- Molding of polymeric microstructures / T. Hanemann, V. Piotter, R. Ruprecht, and J.H. Hausselt -- Acid labile cross-linked units : a concept for improved positive deep-UV photoresists / H.-T. Schacht, P. Falcigno, N. Münzel, R. Schulz, and A. Medina -- Chemistry of ketal resist system and its lithographic performance / Wu-Song Huang, Kim Y. Lee, Rao Bantu, Ranee Kwong, Ahmad Katnani, Mahmoud Khojasteh, William Brunsvold, Steven Holmes, Ronald Nunes, Tsuyoshi Shibata, George Orsula, James Cameron, Dominic Yang, and Roger Sinta -- Photoacid diffusion in chemically amplified DUV resists / Toshiro Itani, Hiroshi Yoshino, Shuichi Hashimoto, Mitsuharu Yamana, Norihiko Samoto, and Kunihiko Kasama -- Highly photosensitive diazo compounds as photoacid generators for chemically amplified resists / Kieko Harada, Masahito Kushida, Kyoichi Saito, Kazuyuki Sugita, and Hirotada Iida -- Exploration of chemically amplified resist mechanisms and performance at small linewidths / James W. Taylor, Paul M. Dentinger, Steven J. Rhyner, and Geoffrey W. Reynolds -- The preparation and investigation of macromolecular architectures for microlithography …
  note: Hiroshi Ito, editor [and others].
  note: Title from PDF title page (ACS publications, viewed August 24, 2009).
  note: "Developed from a symposium sponsored by the Division of Polymeric Materials: Science and Engineering at the 214th ACS National Meeting, Las Vegas, Nevada, September 7-11, 1997."
  note: Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002. http://purl.oclc.org/DLF/benchrepro0212 MiAaHDL
  note: digitized 2010 HathiTrust Digital Library committed to preserve pda MiAaHDL
  note: Includes bibliographical references and indexes.
  note: English.
  subject:
    topic: Microelectronics
    topic: Materials
    genre: Congresses
  subject:
    topic: Polymeric composites
    genre: Congresses
  subject:
    topic: Photoresists
    topic: Materials
    genre: Congresses
  subject:
    topic: Microelectronics
    topic: Materials
  subject:
    topic: Polymeric composites
  subject:
    topic: Photoresists
    topic: Materials
  subject:
    topic: Microélectronique
    topic: Matériaux
  subject:
    topic: Composites polymères
  subject:
    topic: Résines photosensibles
    topic: Matériaux
  subject:
    topic: Microélectronique
    topic: Matériaux
    genre: Congrès
  subject:
    topic: Composites polymères
    genre: Congrès
  subject:
    topic: Résines photosensibles
    topic: Matériaux
    genre: Congrès
  subject:
    topic: TECHNOLOGY & ENGINEERING
    topic: Mechanical
  subject:
    topic: Microelectronics
    topic: Materials
  subject:
    topic: Photoresists
    topic: Materials
  subject:
    topic: Polymeric composites
  subject:
    topic: Microélectronique
  subject:
    topic: Microlithographie
  subject:
    topic: Polymères
  subject:
    topic: Résines photosensibles
  classification: TK7871.15.P6 M517 1998
  classification: 621.381
  related item:
    title info:
      title: Micro- and nanopatterning polymers
    origin info:
      publisher: Washington, DC : American Chemical Society ; [New York] : Distributed by Oxford University Press, ©1998
    identifier: (DLC) 98025955
    identifier: (OCoLC)39257282
  related item:
    title info:
      title: ACS symposium series ; 706
  identifier: 9780841216884
  identifier: 0841216886
  identifier: 0841235813
  identifier: 9780841235816
  identifier: http://proxy.library.tamu.edu/login
  record info:
    record content source: MUU
    record creation date: 090825
    record change date: 20241009195857.4
    record identifier: in00005505852
    language of cataloging:
      language term: eng