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Extreme ultraviolet lithography /

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"Explains the most promising innovation in microlithography today. This landmark resource provides the first complete guide to extreme ultraviolet lithography (EUVL), covering the latest scientific theory, processing methods, applications, and future directions. Edited by two renowned EUVL expe...

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Bibliographic Details
Corporate Author: McGraw-Hill Companies
Other Authors: Wu, Banqiu, Kumar, Ajay, 1962-, Eynon, Benjamin G., Naulleau, Patrick, Richardson, Martin, La Fontaine, Bruno, Yulin, Sergiy, Silver, Richard M., Vladar, Andras E., Kamberian, Henry
Format: eBook
Language:English
Language Notes:In English.
Published: New York, N.Y. : McGraw-Hill Education, [2009]
Edition:First edition.
Series:McGraw-Hill's AccessEngineering.
Subjects:
Extreme ultraviolet lithography.
Integrated circuits > Masks.
Integrated circuits > Design and construction.
Electronic books.
Online Access:Connect to the full text of this electronic book

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