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Nanoscale CMOS VLSI circuits : design for manufacturability /

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Covering the latest devices; technologies; and processes; this detailed guide offers proven methods for optimizing circuit designs to increase the yield; reliability; and manufacturability of products and mitigate defects and failure.

Bibliographic Details
Main Author: Kundu, Sandip (Author)
Corporate Author: McGraw-Hill Companies
Other Authors: Sreedhar, Aswin, Penn, Michael, Fogarty, David E., Darnell, Matt
Format: eBook
Language:English
Language Notes:In English.
Published: New York, N.Y. : McGraw-Hill Education, [2011]
Edition:First edition.
Series:McGraw-Hill's AccessEngineering.
Subjects:
Metal oxide semiconductors, Complementary > Design and construction.
Integrated circuits > Very large scale integration > Design and construction.
Electronic books.
Online Access:Connect to the full text of this electronic book
Table of Contents:
  • Semiconductor manufacturing
  • Process and device variability : analysis and modeling
  • Manufacturing-aware physical design closure
  • Metrology, manufacturing defects, and defect extraction
  • Defect impact modeling and yield improvement techniques
  • Physical design and reliability
  • Design for manufacturability : tools and methodologies.