Photon sources for lithography and metrology /
Photon sources enable the extension of lithography and metrology technologies for continued scaling of circuit elements and therefore are the key drivers for the extension of Moore's law. This comprehensive, 28-chapter volume is the authoritative reference on photon source technology and includ...
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| Format: | Book |
| Language: | English |
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Bellingham, Washington :
SPIE Press,
[2023].
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Table of Contents:
- Photon source technology for lithography and metrology : an overview / Vivek Bakshi
- Laser-produced plasma sources for short-wavelength applications including lithography and microscopy / Gerry O'Sullivan, Padraig Dunne, Takeshi Higashiguchi, Takanori Miyazaki, Fergal O'Reilly, and Emma Sokell
- Radiation-hydrodynamics modeling of LPP EUV sources / Howard Scott, Steve Langer, and Yechiel Frank
- Atomic origins of EUV light / John Sheil, James Colgan, and Oscar Versolato
- Radiation-dominated plasma in LPP sources : physical aspects and challenges for numerical modeling / Mikhail M. Basko
- EUV sources for high-volume manufacturing / Igor Fomenko, David C. Brandt, Alexander I. Ershov, Alexander A. Schafgans, Yezheng Tao, Georgiy O. Vaschenko, and Bruno La Fontaine
- EUV light source for lithography / Hakaru Mizoguchi, Shinji Nagai, Takashi Suganuma, Georg Soumagne, Hiroaki Nakarai, Yoshufumi Ueno, Takashi Saitou, and Tatsuya Yanagida
- The electrodeless Z-pinch metrology source / Stephen Horne, Deborah Gustafson, Matthew J. Partlow, Wolfram Neff, Michael Roderick, and Kosuke Saito
- High-brightness laser-assisted discharge-produced plasma EUV source for mask inspection and exposure applications / Yusuke Teramoto
- Compact EUV sources for metrology and irradiation experiments / Klaus Bergmann, Jochen Vieker, Alexander von Wezyk, and Florian Melsheimer
- The EUV lamp : a discharge-produced metrology EUV source / Rainer Lebert, Christoph Phiesel, Thomas Missalla, and Andreas Biermanns-Föth
- Laser-driven plasma source technology and applications / Huiling Zhu, Toru Fujinami, Xiaohua Ye, Don McDaniel, and Deborah Gustafson
- EUV source metrology / Muharrem Bayraktar, Fei Liu, Oscar Versolato, and Fred Bijkerk
- Collector optics for EUV sources / Sascha Migura, Tobias Müller, and Frank Hartung
- Grazing incidence optics and applications / Ladislav Pína
- Materials processing with focused EUV/soft-X-ray pulses / Kazuyuki Sakaue
- Irreversible changes in materials exposed to EUV radiation / Libor Juha
- Interaction of intense EUV pulses with atomic and molecular gases / Andrzej Bartnik
- Plasma diagnostics / Kentaro Tomita
- Synchrotron-based metrology tools for EUV lithography / Charles Tarrio, Robert E. Vest, Frank Scholze, Michael Kolbe, and Yasin Ekinchi
- Tin mitigation in EUV sources / Gianluca Panici and David N. Ruzic
- Compact, efficient CO2 amplifiers with modular design for high-efficiency EUV power generation / Koji Yasui, Junichi Nishimae, Tatsuya Yamamoto, and Yuzuru Tadokoro
- Excimer lasers for lithography / Hakaru Mizoguchi, Osamu Wakabayashi, Toshihiro Oga, Hiroaki Nakarai, Hiroshi Komori, Kouji Kakizaki, and Junichi Fujimoto
- Coherent EUV light sources based on high-order harmonic generation sources : principles and applications in nanotechnology / Henry Kapteyn, Margaret M. Murnane, Yuka Esashi, Michael Tanksalvala, Joshua L. Knobloch, Chen-Ting Liao, Daniel D. Hickstein, Clayton Bargsten, Kevin Dorney, and John Petersen
- YAG lasers for lithography and metrology / Martin Smrž, Jiří Mužik, and Siva Sankar Nagisetty
- Solid state 2-[mu]m laser drivers for EUV lithography / Brendan A. Reagan, Thomas Galvin, Issa Tamer, Emily Sistrunk, Thomas Spinka, and Craig W. Siders
- Accelerators and compact storage rings for lithography and metrology / Yasin Ekinci, Terence Garvey, Andreas Streun, and Leonid Rivkin
- High-power light source for EUV lithography based on the energy-recovery linac free-electron laser / Hiroshi Kawata, Ryuokou Kato, Hiroshi Sakai, Norio Nakamura, and Ryoichi Hajima
- UV lamps for lithography / Hisakazu Ieuji.