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230101t20232023wau b 001 0 eng |
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20240313152402.9 |
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|a 2022055893
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|a (OCoLC)on1359048330
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|a DLC
|e rda
|c DLC
|d TXA
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| 020 |
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|a 9781510653719
|q (hardcover)
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|a 1510653716
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|z 9781510653726
|q (pdf)
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|a (OCoLC)1359048330
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|a TK7872.M3
|b P473 2023
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|a 621.3815/31
|2 23/eng/20230113
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| 245 |
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|a Photon sources for lithography and metrology /
|c Vivek Bakshi, editor.
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| 264 |
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|a Bellingham, Washington :
|b SPIE Press,
|c [2023].
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| 264 |
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|c ©2023.
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| 300 |
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|a lii, 1250 pages :
|b chiefly color illustrations ;
|c 27 cm.
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| 336 |
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|a text
|b txt
|2 rdacontent
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| 337 |
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|a unmediated
|b n
|2 rdamedia
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| 338 |
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|a volume
|b nc
|2 rdacarrier
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| 504 |
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|a Includes bibliographical references and index.
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|a Photon source technology for lithography and metrology : an overview / Vivek Bakshi -- Laser-produced plasma sources for short-wavelength applications including lithography and microscopy / Gerry O'Sullivan, Padraig Dunne, Takeshi Higashiguchi, Takanori Miyazaki, Fergal O'Reilly, and Emma Sokell -- Radiation-hydrodynamics modeling of LPP EUV sources / Howard Scott, Steve Langer, and Yechiel Frank -- Atomic origins of EUV light / John Sheil, James Colgan, and Oscar Versolato -- Radiation-dominated plasma in LPP sources : physical aspects and challenges for numerical modeling / Mikhail M. Basko -- EUV sources for high-volume manufacturing / Igor Fomenko, David C. Brandt, Alexander I. Ershov, Alexander A. Schafgans, Yezheng Tao, Georgiy O. Vaschenko, and Bruno La Fontaine -- EUV light source for lithography / Hakaru Mizoguchi, Shinji Nagai, Takashi Suganuma, Georg Soumagne, Hiroaki Nakarai, Yoshufumi Ueno, Takashi Saitou, and Tatsuya Yanagida -- The electrodeless Z-pinch metrology source / Stephen Horne, Deborah Gustafson, Matthew J. Partlow, Wolfram Neff, Michael Roderick, and Kosuke Saito -- High-brightness laser-assisted discharge-produced plasma EUV source for mask inspection and exposure applications / Yusuke Teramoto -- Compact EUV sources for metrology and irradiation experiments / Klaus Bergmann, Jochen Vieker, Alexander von Wezyk, and Florian Melsheimer -- The EUV lamp : a discharge-produced metrology EUV source / Rainer Lebert, Christoph Phiesel, Thomas Missalla, and Andreas Biermanns-Föth -- Laser-driven plasma source technology and applications / Huiling Zhu, Toru Fujinami, Xiaohua Ye, Don McDaniel, and Deborah Gustafson -- EUV source metrology / Muharrem Bayraktar, Fei Liu, Oscar Versolato, and Fred Bijkerk -- Collector optics for EUV sources / Sascha Migura, Tobias Müller, and Frank Hartung -- Grazing incidence optics and applications / Ladislav Pína -- Materials processing with focused EUV/soft-X-ray pulses / Kazuyuki Sakaue -- Irreversible changes in materials exposed to EUV radiation / Libor Juha -- Interaction of intense EUV pulses with atomic and molecular gases / Andrzej Bartnik -- Plasma diagnostics / Kentaro Tomita -- Synchrotron-based metrology tools for EUV lithography / Charles Tarrio, Robert E. Vest, Frank Scholze, Michael Kolbe, and Yasin Ekinchi -- Tin mitigation in EUV sources / Gianluca Panici and David N. Ruzic -- Compact, efficient CO2 amplifiers with modular design for high-efficiency EUV power generation / Koji Yasui, Junichi Nishimae, Tatsuya Yamamoto, and Yuzuru Tadokoro -- Excimer lasers for lithography / Hakaru Mizoguchi, Osamu Wakabayashi, Toshihiro Oga, Hiroaki Nakarai, Hiroshi Komori, Kouji Kakizaki, and Junichi Fujimoto -- Coherent EUV light sources based on high-order harmonic generation sources : principles and applications in nanotechnology / Henry Kapteyn, Margaret M. Murnane, Yuka Esashi, Michael Tanksalvala, Joshua L. Knobloch, Chen-Ting Liao, Daniel D. Hickstein, Clayton Bargsten, Kevin Dorney, and John Petersen -- YAG lasers for lithography and metrology / Martin Smrž, Jiří Mužik, and Siva Sankar Nagisetty -- Solid state 2-[mu]m laser drivers for EUV lithography / Brendan A. Reagan, Thomas Galvin, Issa Tamer, Emily Sistrunk, Thomas Spinka, and Craig W. Siders -- Accelerators and compact storage rings for lithography and metrology / Yasin Ekinci, Terence Garvey, Andreas Streun, and Leonid Rivkin -- High-power light source for EUV lithography based on the energy-recovery linac free-electron laser / Hiroshi Kawata, Ryuokou Kato, Hiroshi Sakai, Norio Nakamura, and Ryoichi Hajima -- UV lamps for lithography / Hisakazu Ieuji.
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| 520 |
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|a Photon sources enable the extension of lithography and metrology technologies for continued scaling of circuit elements and therefore are the key drivers for the extension of Moore's law. This comprehensive, 28-chapter volume is the authoritative reference on photon source technology and includes contributions from leading researchers and suppliers in the photon source field. It is intended to meet the needs of both practitioners of the technology and readers seeking a thorough introduction to EUV photon sources and their applications. Topics include a state-of-the-art overview and in-depth explanation of photons source requirements, fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPPs) and laser-produced plasmas (LPPs), a description of prominent DPP and LPP designs and other technologies for producing EUV radiation at 13.5 nm. Additionally, this volume contains detailed descriptions of 193-nm excimer lasers, UV lamps and laser-driven plasma sources for UV photons, all of which power many current lithography and metrology tools. CO2 lasers and 1-um Nd- YAG lasers, used for pre-pulse in Sn LPP EUV sources, are also covered. Alternative photon sources for 13.5-nm lithography and metrology, such as high-harmonic generation (HHG) and synchrotrons, along with their usage as a metrology tool, are discussed and potential future photon sources such as free-electron lasers (FELs), solid-state 2-um thulium lasers and 1-um Nd-YAG lasers are described. Additional topics include EUV source metrology, plasma diagnostics of EUV plasmas, grazing and normal incidence collector optics for plasma sources, debris mitigation and mechanisms of component erosion in EUV sources.
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| 650 |
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|a Extreme ultraviolet lithography.
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| 650 |
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0 |
|a Laser plasmas.
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| 650 |
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0 |
|a Speckle metrology.
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| 650 |
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0 |
|a Holography.
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| 650 |
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0 |
|a Ultraviolet radiation
|x Industrial applications.
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| 650 |
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0 |
|a Lasers
|x Industrial applications.
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| 700 |
1 |
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|a Bakshi, Vivek,
|e editor.
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| 948 |
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|a dmitchel 3/13/24 10.20.30
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| 994 |
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|a Z0
|b TXA
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|a Texas A&M University
|b College Station
|c Sterling C. Evans Library
|d Evans: Library Stacks
|t 0
|e TK7872.M3 P473 2023
|h Library of Congress classification
|i unmediated -- volume
|m A14852098749
|
| 952 |
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|a Texas A&M University
|b College Station
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| 998 |
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