rdf-syntax-grammar
mods:
  schema location: http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
  title info:
    title: Silicon photonics
    sub title: an introduction
  name:
    name part: Reed, Graham T.
    role:
      role term: creator
    role:
      role term: author.
  name:
    name part: Knights, Andrew P.
    role:
      role term: author.
  type of resource: text
  genre: bibliography
  origin info:
    place:
      place term: enk
    place:
      place term: Chichester
    publisher: John Wiley
    date issued: ©2004
    date issued: 2004
    issuance: monographic
  language:
    language term: eng
  physical description:
    form: remote
    extent: 1 online resource (xviii, 255 pages) : illustrations
  abstract: The growing demand for instant and reliable communication means that photonic circuits are increasingly finding applications in optical communications systems. One of the prime candidates to provide satisfactory performance at low cost in the photonic circuit is silicon. Whilst silicon photonics is less well developed as compared to some other material technologies, it is poised to make a serious impact on the telecommunications industry, as well as in many other applications, as other technologies fail to meet the yield/performance/cost trade-offs. Following a sympathetic tutorial approach,
  table of contents: Silicon Photonics; Contents; About the Authors; Foreword; Acknowledgements; 1 Fundamentals; 1.1 What is Phase?; 1.2 What is Polarisation?; 1.3 What is Interference?; 2 The Basics of Guided Waves; 2.1 The Ray Optics Approach to Describing Planar Waveguides; 2.2 Reflection Coefficients; 2.3 Phase of a Propagating Wave and its Wavevector; 2.4 Modes of a Planar Waveguide; 2.4.1 The Symmetrical Planar Waveguide; 2.4.2 The Asymmetrical Planar Waveguide; 2.4.3 Solving the Eigenvalue Equations for Symmetrical and Asymmetrical Waveguides; 2.4.4 Monomode Conditions; 2.4.5 Effective Index of a Mode
  table of contents: 2.5 A Taste of Electromagnetic Theory2.6 Simplifying and Solving the Wave Equation; 2.7 Another Look at Propagation Constants; 2.8 Mode Profiles; 2.9 Confinement Factor; 2.10 The Goos-Hänchen Shift; 3 Characteristics of Optical Fibres for Communications; 3.1 The Structure of Optical Fibres; 3.2 Modes of an Optical Fibre; 3.2.1 Modes of a Step-index Fibre; 3.2.2 Modes of a Graded-index Fibre; 3.3 Numerical Aperture and Acceptance Angle; 3.4 Dispersion in Optical Fibres; 3.4.1 Intermodal Dispersion; 3.4.2 Intramodal Dispersion
  table of contents: 3.5 Single-mode Fibres: Mode Profile, Mode-field Diameter, and Spot Size3.6 Normalised Frequency, Normalised Propagation Constant, and Cutoff Wavelength; References; 4 Silicon-on-Insulator (SOI) Photonics; 4.1 Introduction; 4.2 Silicon-on-Insulator Waveguides; 4.2.1 Modes of Two-dimensional Waveguides; 4.3 The Effective Index Method of Analysis; 4.4 Large Single-mode Rib Waveguides; 4.5 Refractive Index and Loss Coefficient in Optical Waveguides; 4.6 Contributions to Loss in an Optical Waveguide; 4.6.1 Scattering; 4.6.2 Absorption; 4.6.3 Radiation; 4.7 Coupling to the Optical Circuit
  table of contents: 4.7.1 Grating Couplers4.7.2 Butt Coupling and End-fire Coupling; 4.7.3 Robust Coupling to Waveguides for Commercial Applications; 4.7.4 Measurement of Propagation Loss in Integrated Optical Waveguides; 4.8 Optical Modulation Mechanisms in Silicon; 4.8.1 Electric Field Effects; 4.8.2 Carrier Injection or Depletion; 4.8.3 The Thermo-optic Effect; 4.9 Other Advantages and Disadvantages of Silicon Photonics; References; 5 Fabrication of Silicon Waveguide Devices; 5.1 Silicon-on-Insulator (SOI); 5.1.1 Separation by IMplanted OXygen (SIMOX); 5.1.2 Bond and Etch-back SOI (BESOI)
  table of contents: 5.1.3 Wafer Splitting (SmartCut(®) Process to Produce Unibond(®) Wafers)5.1.4 Silicon Epitaxial Growth; 5.1.5 Deciding on the SOI; 5.2 Fabrication of Surface Etched Features; 5.2.1 Photolithography; 5.2.2 Silicon Etching; 5.2.3 Critical Dimension Control; 5.3 Oxidation; 5.4 Formation of Submicron Silicon Waveguides; 5.4.1 Silicon Dioxide Thickness; 5.4.2 Surface and Interface Roughness; 5.4.3 Sidewall Roughness; 5.5 Silicon Doping; 5.5.1 Ion Implantation; 5.5.2 The Implantation System; 5.5.3 Implantation Parameters; 5.5.4 Dopant Activation and Drive-in; 5.6 Metallisation; 5.6.1 Via Formation
  note: Graham T. Reed, Andrew P. Knights.
  note: Electronic reproduction. [Place of publication not identified] : HathiTrust Digital Library, 2010. MiAaHDL
  note: Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002. http://purl.oclc.org/DLF/benchrepro0212 MiAaHDL
  note: digitized 2010 HathiTrust Digital Library committed to preserve pda MiAaHDL
  note: Includes bibliographical references and index.
  note: English.
  subject:
    topic: Optoelectronic devices
  subject:
    topic: Silicon
    topic: Optical properties
  subject:
    topic: Photonics
  classification: TA1750 .S55 2004eb
  classification: 621.38152
  classification: TN204
  related item:
    title info:
      title: Silicon photonics
    name:
      name part: Reed, Graham T.
    origin info:
      publisher: Chichester : John Wiley, ©2004
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  identifier: http://proxy.library.tamu.edu/login
  record info:
    record content source: NhCcYBP
    record creation date: 041015
    record change date: 20260214200545.2
    record identifier: in00004676147
    language of cataloging:
      language term: eng