| Tag |
First Indicator |
Second Indicator |
Subfields |
| LEADER |
00000nam a2200000 i 4500 |
| 001 |
in00004675813 |
| 006 |
m o d |
| 007 |
cr cnu|||unuuu |
| 008 |
210504s2021 gw ob 001 0 eng d |
| 005 |
20260214233147.7 |
| 020 |
|
|
|a 9783527824199
|q (electronic bk.)
|
| 020 |
|
|
|a 3527824197
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| 020 |
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| 020 |
|
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|
| 020 |
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| 024 |
7 |
|
|a 10.1002/9783527824199
|2 doi
|
| 035 |
|
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|a wil6007436
|
| 035 |
|
|
|a (NhCcYBP)wil6007436
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| 037 |
|
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|a 9783527824205
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|
| 040 |
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|a NhCcYBP
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|c NhCcYBP
|
| 050 |
|
4 |
|a TK7871.85
|b .L55 2021
|
| 082 |
0 |
4 |
|a 621.3815/2
|2 23
|
| 100 |
1 |
|
|a Lill, Thorsten,
|e author.
|
| 245 |
1 |
0 |
|a Atomic layer processing :
|b semiconductor dry etching technology /
|c Thorsten Lill.
|
| 264 |
|
1 |
|a Weinheim, Germany :
|b Wiley-VCH,
|c 2021.
|
| 300 |
|
|
|a 1 online resource
|
| 336 |
|
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|a text
|b txt
|2 rdacontent
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| 337 |
|
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|a computer
|b c
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|
| 338 |
|
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|a online resource
|b cr
|2 rdacarrier
|
| 505 |
0 |
|
|a Introduction -- Fundamentals -- Thermal Etching -- Thermal Isotropic ALE -- Radical Etching -- Directional ALE -- Reactive Ion Etching -- Ion Beam Etching -- Etching Species Generation -- Emerging Etching Technologies.
|
| 504 |
|
|
|a Includes bibliographical references and index.
|
| 588 |
0 |
|
|a Online resource; title from PDF title page (John Wiley, viewed May 4, 2021).
|
| 650 |
|
0 |
|a Semiconductors
|x Etching.
|
| 655 |
|
4 |
|a Electronic books.
|
| 776 |
0 |
8 |
|i Print version:
|z 3527346686
|z 9783527346684
|
| 856 |
4 |
0 |
|u http://proxy.library.tamu.edu/login?url=https://onlinelibrary.wiley.com/book/10.1002/9783527824199
|z Connect to the full text of this electronic book
|t 0
|
| 955 |
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|a Wiley EBA record
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| 975 |
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|p Wiley UBCM Full Collection 2026
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|t 0
|
| 952 |
f |
f |
|a Texas A&M University
|b College Station
|c Electronic Resources
|s evans_pda
|d Available Online
|t 0
|e TK7871.85 .L55 2021
|h Library of Congress classification
|
| 998 |
f |
f |
|a TK7871.85 .L55 2021
|t 0
|l Available Online
|