rdf-syntax-grammar
mods:
  schema location: http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
  title info:
    title: Optical and EUV lithography
    sub title: a modeling perspective
  name:
    name part: Erdmann, Andreas
    role:
      role term: creator
    role:
      role term: author.
  type of resource: text
  genre: bibliography
  origin info:
    place:
      place term: wau
    date issued: 2021
    issuance: monographic
  language:
    language term: eng
  physical description:
    form: print
    extent: xxii, 351 pages : illustrations (some color) ; 26 cm.
  abstract: "State-of-the-art semiconductor lithography combines the most advanced optical systems of our world with cleverly designed and highly optimized photochemical materials and processes to fabricate micro- and nanostructures that enable our modern information society. The precise fabrication and metrology of nanopatterns requires an in depth understanding of all involved physical and chemical effects. This book tries to support such understanding from a modeling-driven perspective, but without a heavy mathematical apparatus. The material for this book was compiled in many years of teaching lectures on "Optical lithography Technology, Physical Effects, and Modeling" at the Friedrich-Alexander-University Erlangen-Nuremberg and in the preparation of dedicated courses on special aspects of lithography. The book is intended to help interested students with background in physics, optics, computational engineering, mathematics, chemistry, material science, nanotechnology and other areas to get started in the fascinating field of lithographic techniques for nanofabrication. It should also help senior engineers and managers to widen their view on alternative methods and applications"--
  note: Andreas Erdmann.
  note: Includes bibliographical references and index.
  subject:
    topic: Photolithography
  subject:
    topic: Extreme ultraviolet lithography
  subject:
    topic: Extreme ultraviolet lithography
  subject:
    topic: Photolithography
  classification: TR940 .E73 2021
  classification: 686.2/32
  related item:
    title info:
      title: Optical and euv lithography: a modeling perspective
    name:
      name part: Erdmann, Andreas,
    origin info:
      publisher: Bellingham : SPIE--The International Society for Optical Engineering, 2021.
    identifier: (DLC) 2020041504
  identifier: 9781510639010
  identifier: 1510639012
  identifier: 9781510639027
  identifier: 2020041503
  record info:
    record content source: DLC
    record creation date: 200923
    record change date: 20210408184334.0
    record identifier: in00004411766
    language of cataloging:
      language term: eng