Far-infrared dielectric functions : silicon nitride (SiNx), silicon oxide (SiOx), and high-purity silicon (Si) /

Bibliographic Details
Main Authors: Cataldo, Giuseppe (Author), Wollack, Edward J. (Author)
Format: Government Document eBook
Language:English
Published: Greenbelt, MD : National Aeronautics and Space Administration, Goddard Space Flight Center, September 2020.
Series:NASA technical memorandum ; 20205007162.
Subjects:
Online Access:https://purl.fdlp.gov/GPO/gpo146378

MARC

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245 1 0 |a Far-infrared dielectric functions :  |b silicon nitride (SiNx), silicon oxide (SiOx), and high-purity silicon (Si) /  |c Giuseppe Cataldo, Edward J. Wollack. 
246 3 |a Silicon nitride (SiNx), silicon oxide (SiOx), and high-purity silicon (Si) 
264 1 |a Greenbelt, MD :  |b National Aeronautics and Space Administration, Goddard Space Flight Center,  |c September 2020. 
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588 |a Description based on online resource, PDF version; title from title page (NASA, viewed on Oct. 21, 2020). 
650 7 |a Numerical analysis.  |2 nasat 
650 7 |a Dielectric properties.  |2 nasat 
650 7 |a Dielectrics.  |2 nasat 
700 1 |a Wollack, Edward J.,  |e author. 
710 2 |a Goddard Space Flight Center,  |e issuing body. 
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