CMOS past, present and future /

Bibliographic Details
Corporate Author:	ScienceDirect (Online service)
Other Authors:	Radamson, Henry H.
Format:	eBook
Language:	English
Published:	Duxford : Woodhead Publishing, 2018.
Series:	Woodhead Publishing series in electronic and optical materials.
Subjects:	Metal oxide semiconductors, Complementary. Electronic books.
Online Access:	Connect to the full text of this electronic book

Table of Contents:

1. Brief introduction CMOS applications in our daily life; 2. Basic definitions and equations; 3. Electrical measurements (IV, short channel effects, mobility and noise); 4. CMOS Architecture; 5. Strain engineering (stressor materials in source/drain regions, strain induced by processing, stress liners); 6. High-k and metal gate (Almost all known high-k materials and metal gates); 7. Channel materials (Ge, GeSn, SiGe, Graphene and other II-D crystals, III-V compounds); 8. Contacts (Silicide formation, contact resistance, parasitic contacts); 9. Integration with photonic components (CMOS with lasers, detectors); 10. Technology roadmap (starting from 50's to unknown future); 11. Authors' final words.