CMOS past, present and future /

Bibliographic Details
Corporate Author: ScienceDirect (Online service)
Other Authors: Radamson, Henry H.
Format: eBook
Language:English
Published: Duxford : Woodhead Publishing, 2018.
Series:Woodhead Publishing series in electronic and optical materials.
Subjects:
Online Access:Connect to the full text of this electronic book

MARC

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505 0 |a 1. Brief introduction CMOS applications in our daily life; 2. Basic definitions and equations; 3. Electrical measurements (IV, short channel effects, mobility and noise); 4. CMOS Architecture; 5. Strain engineering (stressor materials in source/drain regions, strain induced by processing, stress liners); 6. High-k and metal gate (Almost all known high-k materials and metal gates); 7. Channel materials (Ge, GeSn, SiGe, Graphene and other II-D crystals, III-V compounds); 8. Contacts (Silicide formation, contact resistance, parasitic contacts); 9. Integration with photonic components (CMOS with lasers, detectors); 10. Technology roadmap (starting from 50's to unknown future); 11. Authors' final words. 
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