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Electron beam induced damage in PECVD Si₃N₄ and SiO₂ films on InP /

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Bibliographic Details
Main Author: Pantic, Dragan M. (Author)
Format: Government Document eBook
Language:English
Published: Cleveland, Ohio : National Aeronautics and Space Administration, Lewis Research Center, [1990]
Series:NASA technical memorandum ; 102544.
Subjects:
Capacitance-voltage characteristics.
Electron beams.
Indium phosphides.
Irradiation.
Phosphorus.
Plasmas (physics)
Radiation damage.
Vapor deposition.
Online Access:https://purl.fdlp.gov/GPO/LPS69699
Description
Item Description:"Performing organization: National Aeronautics and Space Administration, Lewis Research Center"--Report documentation page.
Physical Description:1 online resource (15 pages) : illustrations.
Bibliography:Includes bibliographical references (page 13).