rdf-syntax-grammar
mods:
  schema location: http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
  title info:
    title: Epitaxial growth of complex metal oxides
    sub title: techniques, properties and applications
  name:
    name part: Koster, Gertjan
    name part: 1971-
    role:
      role term: editor.
  name:
    name part: Huijben, M.
    role:
      role term: editor.
  name:
    name part: Rijnders, Guus
    role:
      role term: editor.
  name:
    name part: Knovel (Firm)
  type of resource: text
  genre: bibliography
  genre: Electronic books.
  origin info:
    place:
      place term: ne
    date issued: 2015
    copyright date: 2015
    issuance: monographic
  language:
    language term: eng
  physical description:
    form: remote
    extent: 1 online resource : illustrations (some color).
  abstract: The atomic arrangement and subsequent properties of a material are determined by the type and conditions of growth leading to epitaxy, making control of these conditions key to the fabrication of higher quality materials. Epitaxial Growth of Complex Metal Oxides reviews the techniques involved in such processes and highlights recent developments in fabrication quality which are facilitating advances in applications for electronic, magnetic and optical purposes. Part One reviews the key techniques involved in the epitaxial growth of complex metal oxides, including growth studies using reflec.
  table of contents: Front Cover; Related titles; Epitaxial Growth of Complex Metal OxidesWoodhead Publishing Series in Electronic and Optical Materials: Number 76Edited byG ...; Copyright; Contents; List of contributors; Woodhead Publishing Series in Electronic and Optical Materials; Part 1 -- Epitaxial growth of complex metal oxides; 1 -- Growth studies of heteroepitaxial oxide thin films using reflection high-energy electron diffraction (RHEED); 1.1 Introduction: reflection high-energy electron diffraction and pulsed laser deposition; 1.2 Basic principles of RHEED1
  table of contents: 1.3 Variations of the specular intensity during deposition1.4 RHEED intensity variations during heteroepitaxy: examples; 1.5 Conclusions; Acknowledgments; References; 2 -- Sputtering techniques for epitaxial growth of complex oxides; 2.1 Introduction; 2.2 General considerations for sputtering of complex oxides; 2.3 A practical guide to the sputtered growth of perovskite titanate ferroelectrics; 2.4 Conclusions; References; 3 -- Hybrid molecular beam epitaxy for the growth of complex oxide materials; 3.1 Introduction; 3.2 Metal-organic precursors for oxide hybrid molecular beam epitaxy (HMBE)
  table of contents: 3.3 Deposition kinetics of binary oxides from metal-organic (MO) precursors3.4 Opening a growth window with MO precursors; 3.5 Properties of materials grown by hybrid oxide molecular beam epitaxy (MBE); 3.6 Limitations of HMBE and future developments; Acknowledgments; References; 4 -- Chemical solution deposition techniques for epitaxial growth of complex oxides; 4.1 Introduction; 4.2 Reagents and solvents; 4.3 Types of chemical solution deposition (CSD) processes; 4.4 Film and pattern formation; 4.5 Crystallization, densification and epitaxy; 4.6 Examples of CSD-derived oxide films
  table of contents: 4.7 ConclusionsReferences; 5 -- Epitaxial growth of superconducting oxides; 5.1 Introduction; 5.2 Overview of epitaxial growth of superconducting oxides; 5.3 Requirements for growth of high-quality complex metal-oxide films by molecular-beam epitaxy (MBE); 5.4 Case studies; 5.5 Synthesis of new superconductors by thin-film growth methods; 5.6 Conclusions and future trends; 5.7 Sources of further information and advice; Acknowledgments; References; 6 -- Epitaxial growth of magnetic-oxide thin films; 6.1 Introduction; 6.2 Magnetism and major magnetic-oxide systems
  table of contents: 6.3 The effects of thin-film epitaxy on magnetism6.4 Characterization of magnetic-oxide thin films; 6.5 Applications of epitaxial magnetic-oxide thin films; 6.6 Future of epitaxy of complex-oxide magnets; Acknowledgments; References; Part 2 -- Properties and analytical techniques; 7 -- The effects of strain on crystal structure and properties during epitaxial growth of oxides; 7.1 Introduction; 7.2 Crystal structures of perovskites and related oxides; 7.3 Lattice mismatch-induced stress accommodation in oxide thin films
  note: edited by G. Koster, M. Huijben and G. Rijnders.
  note: Includes bibliographical references and index.
  subject:
    topic: Epitaxy
  subject:
    topic: Metallic oxides
  subject:
    topic: SCIENCE / Chemistry / Inorganic
  subject:
    topic: Epitaxy
  subject:
    topic: Thin films -- Surfaces
  subject:
    topic: Thin films, Multilayered
  subject:
    topic: Epitaxy
  subject:
    topic: Metallic oxides
  classification: QD181.O1
  classification: 546.721
  related item:
    title info:
      title: Epitaxial Growth of Complex Metal Oxides : Techniques, Properties and Applications
    name:
      name part: Koster, Gertjan
    origin info:
      publisher: Burlington : Elsevier Science,c2015
  related item:
    title info:
      title: Woodhead Publishing series in electronic and optical materials ; no. 76
  identifier: 9781782422556
  identifier: 1782422552
  identifier: 9781782422457
  identifier: 1782422455
  identifier: http://proxy.library.tamu.edu/login
  record info:
    record content source: N$T
    record creation date: 150519
    record change date: 20260609152403.1
    record identifier: in00003833771
    language of cataloging:
      language term: eng