Electromigration in thin films and electronic devices : materials and reliability /
Understanding and limiting electromigration in thin films is essential to the continued development of advanced copper interconnects for integrated circuits. Electromigration in thin films and electronic devices provides an up-to-date review of key topics in this commercially important area. Part on...
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| Format: | eBook |
| Language: | English |
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Oxford :
Woodhead Pub.,
2011.
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| Series: | Woodhead Publishing in materials.
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| Online Access: | Connect to the full text of this electronic book |
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