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Electromigration in thin films and electronic devices : materials and reliability /

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Understanding and limiting electromigration in thin films is essential to the continued development of advanced copper interconnects for integrated circuits. Electromigration in thin films and electronic devices provides an up-to-date review of key topics in this commercially important area. Part on...

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Bibliographic Details
Corporate Author: Knovel (Firm)
Other Authors: Kim, Choong-Un
Format: eBook
Language:English
Published: Oxford : Woodhead Pub., 2011.
Series:Woodhead Publishing in materials.
Subjects:
Thin films.
Electrodiffusion.
Integrated circuits > Deterioration.
Integrated circuits.
Interconnects (Integrated circuit technology)
Thin Films.
TECHNOLOGY & ENGINEERING > Mechanical.
Electronic books.
Online Access:Connect to the full text of this electronic book

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