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High density plasma sources : design, physics, and performance /

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This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielec...

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Bibliographic Details
Corporate Author: Knovel (Firm)
Other Authors: Popov, Oleg A.
Format: eBook
Language:English
Published: Park Ridge, N.J. : Noyes Publications, [1995]
Series:Materials science and process technology series. Electronic materials and process technology.
Subjects:
Plasma density.
High temperature plasmas.
Plasma generators.
TECHNOLOGY & ENGINEERING > Mechanical.
Electronic books.
Online Access:Connect to the full text of this electronic book
Table of Contents:
  • Helicon Plasma Sources
  • Planar Inductive Sources
  • Electrostatically-Shielded Inductively-Coupled RF Plasma Sources
  • Very High Frequency Capacitive Plasma Sources
  • Surface Wave Plasma Sources
  • Microwave Plasma Disk Processing Machines
  • Electron Cyclotron Resonance Plasma Sources
  • Distributed ECR Plasma Sources
  • References
  • Index.