Handbook of chemical vapor deposition : principles, technology, and applications /

CVD technology has grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is...

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Bibliographic Details
Main Author: Pierson, Hugh O.
Corporate Author: Knovel (Firm)
Format: eBook
Language:English
Published: Norwich, N.Y. : Noyes Publications, 1999.
Edition:2nd ed.
Series:Materials science and process technology series. Electronic materials and process technology.
Subjects:
Online Access:Connect to the full text of this electronic book
Description
Summary:CVD technology has grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Readers will find data on both Plasma CVD and metallo-organic CVD processes. The book also explains the growing importance of CVD in production of semiconductor and related applications.
Item Description:Electronic resource.
Physical Description:1 online resource (xxiv, 482 pages) : illustrations.
Bibliography:Includes bibliographical references and index.
ISBN:1591240301
9781591240303
9780815517436
0815517432