http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
Handbook of plasma processing technology
fundamentals, etching, deposition, and surface interactions
1 online resource (xxiii, 523 pages) : illustrations.
An overview of the technology that describes the advantages provided by plasmas, plasma fundamentals, and a range of plasma processes relevant to the deposition and etching of thin films for microelectronics and other fields.
edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood.
Includes bibliographical references and index.
Park Ridge, N.J. : Noyes Publications, ©1990
Materials science and process technology series