rdf-syntax-grammar
mods:
  schema location: http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
  title info:
    title: Handbook of plasma processing technology
    sub title: fundamentals, etching, deposition, and surface interactions
  name:
    name part: Rossnagel, Stephen M.
  name:
    name part: Cuomo, J. J.
  name:
    name part: Westwood, William D. (William Dickson)
    name part: 1937-
  name:
    name part: Knovel (Firm)
  type of resource: text
  genre: bibliography
  genre: Electronic books.
  origin info:
    place:
      place term: nju
    date issued: 1990
    issuance: monographic
  language:
    language term: eng
  physical description:
    form: remote
    extent: 1 online resource (xxiii, 523 pages) : illustrations.
  abstract: An overview of the technology that describes the advantages provided by plasmas, plasma fundamentals, and a range of plasma processes relevant to the deposition and etching of thin films for microelectronics and other fields.
  note: edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood.
  note: Electronic resource.
  note: Includes bibliographical references and index.
  subject:
    topic: Plasma engineering
  subject:
    topic: Semiconductors
    topic: Etching
  subject:
    topic: Plasma etching
  subject:
    topic: Plasma engineering
  subject:
    topic: Plasma etching
  subject:
    topic: Semiconductors
    topic: Etching
  classification: TA2020 .H37 1990eb
  classification: 621.044
  related item:
    title info:
      title: Handbook of plasma processing technology
    origin info:
      publisher: Park Ridge, N.J. : Noyes Publications, ©1990
    identifier: (DLC) 89022834
    identifier: (OCoLC)20265048
  related item:
    title info:
      title: Materials science and process technology series
  identifier: 1591242975
  identifier: 9781591242970
  identifier: 9780815512202
  identifier: 0815512201
  identifier: http://proxy.library.tamu.edu/login
  record info:
    record content source: KNOVL
    record creation date: 020204
    record change date: 20260609152432.0
    record identifier: in00003827382
    language of cataloging:
      language term: eng