rdf-syntax-grammar
mods:
  schema location: http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
  title info:
    title: Handbook of VLSI microlithography
    sub title: principles, technology, and applications
  name:
    name part: Helbert, John N.
  name:
    name part: Knovel (Firm)
  type of resource: text
  genre: bibliography
  genre: Electronic books.
  origin info:
    place:
      place term: nju
    date issued: 2001
    edition: 2nd ed.
    issuance: monographic
  language:
    language term: eng
  physical description:
    form: remote
    extent: 1 online resource (xxi, 1001 pages) : illustrations.
  abstract: This handbook gives readers a look at the technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings - including optical lithography, electron beam, ion beam, and X-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge, and pattern feature dimension control. The book's explanation of resist and resist process equipment technology describes the relationship between the resist process and equipment parameters. The basics of resist technology are also covered - including an entire chapter on resist process defectivity and the potential yield limiting effect on device production.
  table of contents: Issues and Trends Affecting Lithography Tool Selection Strategy -- Resist Technology: Design, Processing and Applications -- Lithography Process Monitoring and Defect Detection -- Techniques and Tools for Photo Metrology -- Techniques and Tools for Optical Lithography -- Microlithography Tool Automation -- Electron Beam ULSI Applications -- Rational Vibration and Structural Dynamics for Lithographic Tool Installations -- Applications of Ion Microbeam Lithography and Direct Processing -- X-Ray Lithography.
  note: edited by John N. Helbert.
  note: Electronic resource.
  note: Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002. http://purl.oclc.org/DLF/benchrepro0212 MiAaHDL
  note: digitized 2010 HathiTrust Digital Library committed to preserve pda MiAaHDL
  note: Includes bibliographical references and index.
  subject:
    topic: Integrated circuits
    topic: Very large scale integration
  subject:
    topic: Microlithography
  subject:
    topic: TECHNOLOGY & ENGINEERING
    topic: Electronics
    topic: Circuits
    topic: General
  subject:
    topic: Integrated circuits
    topic: Very large scale integration
  subject:
    topic: Microlithography
  classification: TK7874 .H3494 2001eb
  classification: 621.3815/31
  related item:
    title info:
      title: Handbook of VLSI microlithography
    origin info:
      publisher: Park Ridge, N.J. : Noyes Publications ; Norwich, N.Y. : William Andrew Pub., ©2001
      edition: 2nd ed.
    identifier: (DLC) 00028173
    identifier: (OCoLC)43591143
  related item:
    title info:
      title: Materials science and process technology series
      part name: Electronic materials and process technology
  identifier: 1591242754
  identifier: 9781591242758
  identifier: 9780815517801
  identifier: 0815517807
  identifier: 9780815514442
  identifier: 0815514441
  identifier: 153814:153974 Elsevier Science & Technology
  identifier: http://proxy.library.tamu.edu/login
  record info:
    record content source: KNOVL
    record creation date: 020130
    record change date: 20260609152711.3
    record identifier: in00003827363
    language of cataloging:
      language term: eng