Advanced Photoresist Technologies by Intricate Molecular Brush Architectures /

Bibliographic Details
Main Author: Cho, Sangho (Author)
Other Authors: Wooley, Karen L. (Thesis advisor)
Format: Thesis eBook
Language:English
Published: [College Station, Texas] : [Texas A & M University], [2015]
Subjects:
Online Access:Link to OAK Trust copy

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