APA (7th ed.) Citation

Cho, S., & Wooley, K. L. (2015). Advanced Photoresist Technologies by Intricate Molecular Brush Architectures. [Texas A & M University].

Chicago Style (17th ed.) Citation

Cho, Sangho, and Karen L. Wooley. Advanced Photoresist Technologies by Intricate Molecular Brush Architectures. [College Station, Texas]: [Texas A & M University], 2015.

MLA (9th ed.) Citation

Cho, Sangho, and Karen L. Wooley. Advanced Photoresist Technologies by Intricate Molecular Brush Architectures. [Texas A & M University], 2015.