Advanced nano deposition methods /

Bibliographic Details
Corporate Author: Wiley InterScience (Online service)
Other Authors: Lin, Yuan (Editor), Chen, Xin (Editor)
Format: eBook
Language:English
Published: Weinheim, Germany : Wiley-VCH, [2016]
Subjects:
Online Access:Connect to the full text of this electronic book

MARC

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245 0 0 |a Advanced nano deposition methods /  |c edited by Yuan Lin and Xin Chen. 
264 1 |a Weinheim, Germany :  |b Wiley-VCH,  |c [2016] 
300 |a 1 online resource. 
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504 |a Includes bibliographical references and index. 
505 0 |a Cover; Title Page; Copyright; Contents; List of Contributors; Chapter 1 Pulsed Laser Deposition for Complex Oxide Thin Film and Nanostructure; 1.1 Introduction; 1.2 Pulsed Laser Deposition System Setup; 1.3 Advantages and Disadvantages of Pulsed Laser Deposition; 1.4 The Thermodynamics and Kinetics of Pulsed Laser Deposition; 1.4.1 Laser-Material Interactions; 1.4.2 Dynamics of the Plasma; 1.4.3 Nucleation and Growth of the Film on the Substrate Surface; 1.5 Monitoring of Growth Kinetics; 1.5.1 Introduction and RHEED Studies; 1.5.2 Growth Kinetics Studies by Surface X-ray Diffraction 
505 8 |a 1.6 Fundamental Parameters in Thin Film Growth 1.6.1 Substrate Temperature; 1.6.2 Background Gas Pressure; 1.6.3 Laser Fluence and Ablation Area; 1.6.4 Target-Substrate Distance; 1.6.5 Post-Annealing; 1.6.6 Lattice Misfit; 1.7 Pulsed Laser Deposition for Complex Oxide Thin Film Growth; 1.7.1 Pulsed Laser Deposition for Superconductor Thin Film; 1.7.2 Pulsed Laser Deposition for Ferroelectric Thin Films; 1.7.3 Pulsed Laser Deposition for Ferromagnetic Thin Film; 1.7.4 Pulsed Laser Deposition for Multiferroics Thin Film; 1.7.5 Interface Strain Engineering the Complex Oxide Thin Film 
505 8 |a 1.7.5.1 Thickness Effect 1.7.5.2 Substrate Effect; 1.7.5.3 Post-Annealing; 1.8 Pulsed Laser Deposition for Nanostructure Growth; 1.8.1 Self-Assembled Nanoscale Structures; 1.8.2 Geometrically Ordered Arrays; 1.9 Variation of Pulsed Laser Deposition; 1.10 Conclusion; References; Chapter 2 Electron Beam Evaporation Deposition; 2.1 Introduction; 2.2 Electron Beam Evaporation System; 2.2.1 Heating Principle and Characters of Electron Beams; 2.2.1.1 Heating Principle of Electron Beams; 2.2.1.2 Characters of Electron Beams; 2.2.2 Equipments of Electron Beam Source 
505 8 |a 2.2.2.1 Filament and Electron Emission 2.2.2.2 Electron Beam Control; 2.2.2.3 Power Supply, Crucibles, and Feed Systems; 2.2.2.4 Source Materials; 2.2.3 Application of Electron Beam Evaporation; 2.2.3.1 Cooling of Electron Beam Gun; 2.2.3.2 Evaporation of Source Materials by Electron Beam; 2.2.3.3 Vacuum Deposition Process of Electron Beam Evaporation; 2.2.3.4 Attention and Warning for Electron Beam Evaporation; 2.3 Characterization of Thin Film; 2.3.1 Surface Morphology by AFM; 2.3.2 Thickness Measurement by Spectroscopic Ellipsometry; 2.4 Summary; Acknowledgments; References 
505 8 |a Chapter 3 Nanostructures and Thin Films Deposited witSputtering 3g3.1 Introduction; 3.2 Nanostructures with Sputtering; 3.2.1 Oxide Nanostructures; 3.2.1.1 Needle-Shaped MoO3 Nanowires; 3.2.1.2 Bi2O3 Nanowires; 3.2.2 Nitride Nanostructures; 3.2.2.1 Graphitic-C3N4 Nanocone Array; 3.2.2.2 InAlN Nanorods; 3.3 Thin Films Deposited with Sputtering; 3.3.1 Metal Alloy Thin Films; 3.3.1.1 LaNi5 Alloy Thin Films; 3.3.1.2 Ni-Mn-In Alloy Thin Films; 3.3.2 Composite Metal Oxide Thin Films; 3.3.2.1 BiFeO3/BaTiO3 Bilayer Thin Films; 3.4 Summary; Acknowledgments; References. 
588 |a Description based on online resource; title from digital title page (viewed on September 30, 2016). 
500 |a Electronic resource. 
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