Optical lithography : here is why /
This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the...
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| Format: | eBook |
| Language: | English |
| Published: |
Bellingham, Wash. (1000 20th St. Bellingham WA 98225-6705 USA) :
SPIE,
2010.
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| Series: | SPIE monograph ;
PM190. |
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| Online Access: | Connect to the full text of this electronic book |
| Summary: | This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get a primer on the outlook of optical lithography and the many next-generation technologies that may greatly enhance semiconductor manufacturing in the near future. |
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| Item Description: | "SPIE digital library." Electronic resource. |
| Physical Description: | 1 online resource (xiv, 477 pages) : illustrations. Also available in print version. |
| Format: | Mode of access: World Wide Web. System requirements: Adobe Acrobat Reader. |
| Bibliography: | Includes bibliographical references and index. |
| ISBN: | 9780819481825 (electronic) |
| DOI: | 10.1117/3.821000 |
| Access: | Restricted to subscribers or individual electronic text purchasers. |