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cr bn |||m|||a |
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050201s2005 waua fob 001 0 eng |
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|a 9780819478702 (electronic)
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|z 0819458295 (print)
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|z 9780819458292 (print)
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|a 10.1117/3.612961
|2 doi
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|a (CaBNVSL)gtp00535576
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|a (OCoLC)435971863
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|a (SPIE)9780819478702
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|a 5311431
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|a CaBNVSL
|c CaBNVSL
|d CaBNVSL
|d UtOrBLW
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|a TK7836
|b .W66 2005e
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|a 621.3815/31
|2 22
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|a Wong, Alfred Kwok-Kit.
|0 http://id.loc.gov/authorities/names/n2001000478
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|a Optical imaging in projection microlithography /
|c Alfred Kwok-Kit Wong.
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|a Bellingham, Wash. (1000 20th St. Bellingham WA 98225-6705 USA) :
|b SPIE,
|c [2005]
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|c ©2005
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| 300 |
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|a 1 online resource (xix, 254 pages) :
|b illustrations.
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|a text
|b txt
|2 rdacontent
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|a computer
|b c
|2 rdamedia
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|a online resource
|b cr
|2 rdacarrier
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| 490 |
1 |
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|a Tutorial texts in optical engineering ;
|v v. TT66
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| 500 |
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|a "SPIE digital library."
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| 500 |
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|a Electronic resource.
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|a Includes bibliographical references (pages 219-229) and index.
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|a 1. Basic electromagnetism. 1.1. Maxwell's equations -- 1.2. Electromagnetic energy -- 1.3. The wave equation -- 1.4. Plane waves -- 1.5. Spherical waves -- 1.6. Harmonic waves -- 1.7. Quasi-monochromatic light.
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|a 2. Elements of geometrical optics. 2.1. The eikonal equation -- 2.2. Light rays -- 2.3. Snell's law -- 2.4. Thin lens -- 2.5. Representation of an exposure system.
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| 505 |
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|a 3. Elements of diffraction theory. 3.1. Qualitative consideration -- 3.2. Reciprocity -- 3.3. The Helmholtz-Kirchhoff theorem -- 3.4. Fresnel-Kirchhoff diffraction -- 3.5. The Rayleigh-Sommerfeld diffraction formula -- 3.6. Fraunhofer diffraction -- 3.7. Fraunhofer diffraction patterns.
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|a 4. Imaging of extended objects with finite sources. 4.1. Coherent illumination -- 4.2. Obliquity factor -- 4.3. Spatial correlation of light -- 4.4. Köhler's illumination method -- 4.5. Partially coherent imaging.
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|a 5. Resolution and image enhancement. 5.1. Image intensity spectrum -- 5.2. Binary intensity objects under on-axis illumination -- 5.3. Off-axis illumination -- 5.4. Attenuated phase-shifting mask -- 5.5. Alternating phase-shifting mask -- 5.6. Minimum half-pitch -- 5.7. Minimum dimension.
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|a 6. Oblique rays. 6.1. Polarization -- 6.2. Vector imaging -- 6.3. Wave propagation across a dielectric interface -- 6.4. Stratified media -- 6.5. Intensity distribution in photoresist -- 6.6. Immersion imaging -- 6.7. Imaging with oblique rays.
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|a 7. Aberrations. 7.1. Diffraction of an aberrated wavefront -- 7.2. General properties of the aberration function -- 7.3. Zernike polynomials -- 7.4. Effects on imaging -- 7.5. Measurement.
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|a 8. Numerical computation. 8.1. Imaging equations -- 8.2. Transmission cross-coefficient integration -- 8.3. Source points integration -- 8.4. Coherent decomposition -- 8.5. Object spectrum -- 8.6. Remarks.
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|a 9 Variabilities. 9.1. Categorization -- 9.2. Proximity effect -- 9.3. Object variabilities (photomask errors) -- 9.4. Polarization effects -- 9.5. Illumination -- 9.6. Pupil -- 9.7. Focus -- 9.8. Dose -- 9.9. Flare -- 9.10. Remarks.
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|a A. Birefringence -- B. Stationarity and ergodicity -- C. Some Zernike polynomials -- D. Simulator accuracy tests -- E. Select refractive indexes -- F. Assorted theorems and identities -- Bibliography -- Solutions to exercises -- Index.
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|a Restricted to subscribers or individual electronic text purchasers.
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|a Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system-level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists.
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| 530 |
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|a Also available in printing.
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| 538 |
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|a Mode of access: World Wide Web.
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| 538 |
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|a System requirements: Adobe Acrobat Reader.
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| 588 |
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|a Title from PDF t.p. (viewed on 8/32/09).
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| 650 |
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|a Imaging systems.
|0 http://id.loc.gov/authorities/subjects/sh85064471
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| 650 |
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|a Microlithography.
|0 http://id.loc.gov/authorities/subjects/sh85084858
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| 655 |
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7 |
|a Electronic books.
|2 local
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| 710 |
2 |
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|a Society of Photo-optical Instrumentation Engineers.
|0 http://id.loc.gov/authorities/names/n78088934
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| 776 |
1 |
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|c (Original)
|z 0819458295
|w (DLC) 2005042537
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| 830 |
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0 |
|a SPIE tutorial texts ;
|v TT66.
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| 856 |
4 |
0 |
|u http://proxy.library.tamu.edu/login?url=https://dx.doi.org/10.1117/3.612961
|z Connect to the full text of this electronic book
|t 0
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|t 0
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| 952 |
f |
f |
|a Texas A&M University
|b College Station
|c Electronic Resources
|d Available Online
|t 0
|e TK7836 .W66 2005e
|h Library of Congress classification
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| 998 |
f |
f |
|a TK7836 .W66 2005e
|t 0
|l Available Online
|