Optical imaging in projection microlithography /
| Main Author: | |
|---|---|
| Corporate Author: | |
| Format: | eBook |
| Language: | English |
| Published: |
Bellingham, Wash. (1000 20th St. Bellingham WA 98225-6705 USA) :
SPIE,
[2005]
|
| Series: | SPIE tutorial texts ;
TT66. |
| Subjects: | |
| Online Access: | Connect to the full text of this electronic book |
| Abstract: | Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system-level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists. |
|---|---|
| Item Description: | "SPIE digital library." Electronic resource. |
| Physical Description: | 1 online resource (xix, 254 pages) : illustrations. Also available in printing. |
| Format: | Mode of access: World Wide Web. System requirements: Adobe Acrobat Reader. |
| Bibliography: | Includes bibliographical references (pages 219-229) and index. |
| ISBN: | 9780819478702 (electronic) |
| DOI: | 10.1117/3.612961 |
| Access: | Restricted to subscribers or individual electronic text purchasers. |